Özet
In this paper, an integrated variability and reliability analysis method based on surrogate models is introduced. The surrogate models here are response surfaces that describe a parametrized complex analytic function. Surrogate models are developed for the drain currents of 65-nm NMOS and PMOS devices in terms of critical process components, terminal voltages, temperature, and time and are based on BSIM model equations. A simulation technique is developed which incorporates the effect of process variations into the design procedure. These models and techniques are verified using circuit simulations of a single transistor and differential amplifier designs.
Orijinal dil | İngilizce |
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Makale numarası | 5893924 |
Sayfa (başlangıç-bitiş) | 466-473 |
Sayfa sayısı | 8 |
Dergi | IEEE Transactions on Device and Materials Reliability |
Hacim | 11 |
Basın numarası | 3 |
DOI'lar | |
Yayın durumu | Yayınlandı - Eyl 2011 |
Harici olarak yayınlandı | Evet |