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Self-distillation with Edge-Aware Pseudo-Masks for Skin Lesion Segmentation

  • Cihan Katar*
  • , E. M. Eksioglu
  • *Bu çalışma için yazışmadan sorumlu yazar
  • Turk-Alman Universitesi
  • Istanbul Technical University

Araştırma sonucu: Kitap/Rapor/Konferans Bildirisinde BölümKonferans katkısıbilirkişi

Özet

Label scarcity remains a significant challenge in skin lesion segmentation due to the cost and expertise required for manual annotation. Self-supervised learning (SSL), particularly self-distillation, offers a promising solution by enabling representation learning without labeled data through a student–teacher framework. We propose a DINO-style self-distillation framework enhanced with edge-aware pseudo-masks generated by the Random Walker algorithm after modified DullRazor preprocessing. Unlike prior works that rely solely on either distillation or pseudo-labeling, our approach jointly optimizes a distillation loss and an auxiliary segmentation loss, encouraging the encoder to capture both semantic structure and boundary-sensitive features. Experiments on the ISIC 2018 dataset show that our method outperforms supervised baselines and other SSL approaches under extreme label scarcity (0.2–1%), achieving up to +15.5% Jaccard and +13.2% F1-score improvement at 0.2% labels. These results demonstrate that edge-aware pseudo-mask guidance can significantly boost representation quality and enable clinically useful segmentation performance with minimal annotation effort.

Orijinal dilİngilizce
Ana bilgisayar yayını başlığıEighteenth International Conference on Machine Vision, ICMV 2025
EditörlerWolfgang Osten
YayınlayanSPIE
ISBN (Elektronik)9798902321873
DOI'lar
Yayın durumuYayınlandı - 25 Şub 2026
Etkinlik18th International Conference on Machine Vision, ICMV 2025 - Paris, France
Süre: 19 Eki 202522 Eki 2025

Yayın serisi

AdıProceedings of SPIE - The International Society for Optical Engineering
Hacim14114
ISSN (Basılı)0277-786X
ISSN (Elektronik)1996-756X

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???event.eventtypes.event.conference???18th International Conference on Machine Vision, ICMV 2025
Ülke/BölgeFrance
ŞehirParis
Periyot19/10/2522/10/25

Bibliyografik not

Publisher Copyright:
© 2026 SPIE.

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