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Residual stresses in (Zr,Hf)N films (up to 11.9 at.% Hf) measured by X-ray diffraction using experimentally calculated XECs

  • E. Atar
  • , C. Sarioglu
  • , H. Cimenoglu
  • , E. S. Kayali*
  • *Bu çalışma için yazışmadan sorumlu yazar
  • Gebze Technical University
  • Marmara University
  • Istanbul Technical University

Araştırma sonucu: Dergiye katkıMakalebilirkişi

22 Atıf (Scopus)

Özet

In the present work, the residual stresses of (Zr,Hf)N films were measured using X-ray diffraction (XRD) fixed incident multiplane technique (FIM) for varying amounts of Hf addition by assuming the film was isotropic and anisotropic (Krönel model). The residual stress values calculated according to isotropic and anisotropic models were almost the same (-6 GPa). Addition up to 11.9 at.% Hf into ZrN films did not affect the level of residual stress.

Orijinal dilİngilizce
Sayfa (başlangıç-bitiş)188-194
Sayfa sayısı7
DergiSurface and Coatings Technology
Hacim191
Basın numarası2-3
DOI'lar
Yayın durumuYayınlandı - 21 Şub 2005

Finansman

The authors gratefully acknowledge the support of NATO TU PVD Coatings Project for the equipment supplied to the Metallurgical and Material Engineering Department of Istanbul Technical University, which was utilized in this study.

Finansörler
North Atlantic Treaty Organization
Istanbul Teknik Üniversitesi

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