Optimization of electrochromic performance of WO3−x films grown by RF sputtering on gallium-doped zinc oxide

Duygu Nuhoğlu, Öcal Tuna, Esra Zayim*

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Özet

The present paper investigates the sputtered tungsten oxide thin films on gallium-doped zinc oxide-coated glass substrates concerning electrochromic behavior since the most promising candidate of smart glass in the future. Concordantly, each of the deposition parameters, including sputter power, total pressure, and O2/Ar + O2 gas ratio in the plasma, were examined in terms of electrochromic applications to enable to use of these values to be brought to large scale in commercial applications. As a result of comprehensive and systematic optimization studies, the optical modulation values were reached from 63.1 % to 70.8 % and the time needed for coloration and bleaching was observed as 7 and 5 s with final deposition values as 45 W power, 10 mTorr pressure, and 25 % O2 ratio. Additionally, whilst durability is still a problem in electrochromic coatings, reasonable durability cycling was achieved after 900 switching without encapsulation.

Orijinal dilİngilizce
Makale numarası136132
DergiMaterials Letters
Hacim362
DOI'lar
Yayın durumuYayınlandı - 1 May 2024

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© 2024 Elsevier B.V.

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