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On the photolysis of phthalic acid dialkyl esters: a product analysis study

  • G. Hizal
  • , Q. Q. Zhu
  • , Ch H. Fischer
  • , P. M. Fritz
  • , W. Schnabel*
  • *Bu çalışma için yazışmadan sorumlu yazar
  • Helmholtz Centre Berlin for Materials and Energy

Araştırma sonucu: Dergiye katkıMakalebilirkişi

20 Atıf (Scopus)

Özet

The following phthalic acid dialkyl esters were subjected to UV irradiation (λinc = 254 nm at 22 °C or λinc = 240-440 nm at 40 °C): phthalic acid di(2-ethylhexyl) ester (DOP), phthalic acid di(n-octyl) ester (DNOP), phthalic acid di(n-decyl) ester (DDP) and phthalic acid dimethyl ester (DMP). In all cases (except DMP) analogous major photoproducts identified by the gas chromatography-mass spectrometry (GCMS) method are formed: 1-alkenes, alkyl alcohols, phthalic acid anhydride, 2-formyl benzoic acid esters and benzoic acid esters. Generally, the quantum yields of decomposition are quite low: φ </0.03. Extension of the linear alcohol chains decreases the stability: φ,(-DMP)<φ(-DNOP)<φ(-DDP). In the absence of O2, DOP, which contains branches in the alcohol chains, is more stable than the isomeric DNOP containing linear alcohol chains: φ(-DOP) <φ(-DNOP).

Orijinal dilİngilizce
Sayfa (başlangıç-bitiş)147-152
Sayfa sayısı6
DergiJournal of Photochemistry and Photobiology A: Chemistry
Hacim72
Basın numarası2
DOI'lar
Yayın durumuYayınlandı - 15 May 1993
Harici olarak yayınlandıEvet

Finansman

This work was financially supported, in part, by Exxon Chemical International Inc. Our special thanks are directed to Mr. A. C. Poppe, Mr. G. de Lucca and Dr. P. Charlier.

Finansörler
Exxon Chemical International Inc.

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