On the photolysis of phthalic acid dialkyl esters: a product analysis study

G. Hizal, Q. Q. Zhu, Ch H. Fischer, P. M. Fritz, W. Schnabel*

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Özet

The following phthalic acid dialkyl esters were subjected to UV irradiation (λinc = 254 nm at 22 °C or λinc = 240-440 nm at 40 °C): phthalic acid di(2-ethylhexyl) ester (DOP), phthalic acid di(n-octyl) ester (DNOP), phthalic acid di(n-decyl) ester (DDP) and phthalic acid dimethyl ester (DMP). In all cases (except DMP) analogous major photoproducts identified by the gas chromatography-mass spectrometry (GCMS) method are formed: 1-alkenes, alkyl alcohols, phthalic acid anhydride, 2-formyl benzoic acid esters and benzoic acid esters. Generally, the quantum yields of decomposition are quite low: φ </0.03. Extension of the linear alcohol chains decreases the stability: φ,(-DMP)<φ(-DNOP)<φ(-DDP). In the absence of O2, DOP, which contains branches in the alcohol chains, is more stable than the isomeric DNOP containing linear alcohol chains: φ(-DOP) <φ(-DNOP).

Orijinal dilİngilizce
Sayfa (başlangıç-bitiş)147-152
Sayfa sayısı6
DergiJournal of Photochemistry and Photobiology A: Chemistry
Hacim72
Basın numarası2
DOI'lar
Yayın durumuYayınlandı - 15 May 1993
Harici olarak yayınlandıEvet

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