@inproceedings{d1eef143ca3b4bda9c928ff93b131a6c,
title = "Near-infrared resonant cavity enhanced silicon microsphere photodetector",
abstract = "Elastic scattering intensity calculations at 90° and 0° for the transverse electric and transverse magnetic polarized light were performed at 1200nm for a 50 μm radius and 3.5 refractive index silicon microsphere. The mode spacing between morphology dependent resonances was found to be 1.76 nm. The linewidth of the morphology dependent resonances was observed to be 0.02 nm, which leads to a quality factor on the order of 104.",
keywords = "Microspheres, Morphology dependent resonances, RCE photodetector, Silicon",
author = "Murib, \{Mohammed Sharif\} and Emre Y{\"u}ce and Oǧuzhan G{\"u}rl{\"u} and Ali Serpeng{\"u}zel",
year = "2009",
doi = "10.1117/12.821198",
language = "English",
isbn = "9780819476401",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Photonic Materials, Devices, and Applications III",
note = "Photonic Materials, Devices, and Applications III ; Conference date: 04-05-2009 Through 06-05-2009",
}