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Molecular monolayers for conformal, nanoscale doping of InP nanopillar photovoltaics

  • Kee Cho*
  • , Daniel J. Ruebusch
  • , Min Hyung Lee
  • , Jae Hyun Moon
  • , Alexandra C. Ford
  • , Rehan Kapadia
  • , Kuniharu Takei
  • , Onur Ergen
  • , Ali Javey
  • *Bu çalışma için yazışmadan sorumlu yazar
  • University of California at Berkeley
  • Lawrence Berkeley National Laboratory

Araştırma çıktısı: Dergi yayınıMakaleHakemli

56 Atıf (Scopus)

Özet

Semiconductor nanopillar arrays with radially doped junctions have been widely proposed as an attractive device architecture for cost effective and high efficiency solar cells. A challenge in the fabrication of three-dimensional nanopillar devices is the need for highly abrupt and conformal junctions along the radial axes. Here, a sulfur monolayer doping scheme is implemented to achieve conformal ultrashallow junctions with sub-10 nm depths and a high electrically active dopant concentration of 1019 - 1020 cm-3 in arrays of InP nanopillars. The enabled solar cells exhibit a respectable conversion efficiency of 8.1% and a short circuit current density of 25 mA/ cm3. The work demonstrates the utility of well-established surface chemistry for fabrication of nonplanar junctions for complex devices.

Orijinal dilİngilizce
Makale numarası203101
DergiApplied Physics Letters
Hacim98
Basın numarası20
DOI'lar
Yayın durumuYayınlandı - 16 May 2011
Harici olarak yayınlandıEvet

Finansman

This work was supported by Mohr Davidow Ventures and NSF (Grant No. 0826145). The S-MLD process development was supported by a LDRD from LBNL. A.J. acknowledges a Sloan research fellowship and support from the World Class University program at Sunchon National University. J.M. acknowledges financial support from Korea Institute for Advancement of Technology (KIAT). R.K. acknowledges an NSF Graduate Fellowship.

FinansörlerFinansör numarası
Mohr Davidow Ventures
National Science Foundation0826145
Lawrence Berkeley National Laboratory
Laboratory Directed Research and Development
Sunchon National University
Korea Institute for Advancement of Technology

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