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Increasing the Loading of Silicon by Artificial Light-Induced Electrodeposition for Li-ion Battery Anodes

  • Ikramul Hasan Sohel
  • , Sedat Küçükköylü
  • , Mustafa Altun
  • , Mehmet Nurullah Ateş*
  • *Bu çalışma için yazışmadan sorumlu yazar
  • Istanbul Technical University
  • Scientific and Technological Research Council of Turkey
  • Bogazici University

Araştırma sonucu: Dergiye katkıMakalebilirkişi

Özet

Photovoltaic effect discovery was crucial in understanding how light affects electrical conductivity. Building on this concept, our study utilizes a similar experimental setup to deposit silicon (Si) using artificial light. Our goal is to leverage the photovoltaic effect to enhance deposition efficiency and improve control over the Si deposition process. Specifically, we explore the incremental deposition of Si through electroplating under artificial light. We propose an innovative deposition mechanism that examines the influence of light on deposition voltage and resistance during Si electroplating. Additionally, our research investigates the effects of layer-by-layer Si deposition and the impact of heat treatment on the final Si anode material. To thoroughly understand the deposition mechanism, we employ various analytical techniques. Scanning electron microscopy and energy-dispersive x-ray spectroscopy provide insights into the morphological and compositional aspects of the Si deposits. Raman spectroscopy is utilized to assess structural properties and confirm the presence of crystalline Si. Cyclic voltammetry offers an understanding of the electrochemical characteristics of the Si-deposited electrodes, shedding light on their performance and stability. Through these methods, we aim to clarify the complex interactions involved and demonstrate how artificial light can be harnessed to advance Si deposition processes.

Orijinal dilİngilizce
Sayfa (başlangıç-bitiş)13461-13475
Sayfa sayısı15
DergiJournal of Materials Engineering and Performance
Hacim34
Basın numarası13
DOI'lar
Yayın durumuYayınlandı - Tem 2025

Bibliyografik not

Publisher Copyright:
© The Author(s) 2025.

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