High-temperature elastic properties of in situ-reinforced Si3N4

Geoffrey A. Swift; Ersan Üstündag; Bjørn Clausen; Mark A.M. Bourke; Hua Tay Lin

doi:10.1063/1.1554478

High-temperature elastic properties of in situ-reinforced Si₃N₄

Geoffrey A. Swift
, Ersan Üstündag^*
, Bjørn Clausen
, Mark A.M. Bourke
, Hua Tay Lin

^*Bu çalışma için yazışmadan sorumlu yazar

Araştırma sonucu: Dergiye katkı › Makale › bilirkişi

13 Atıf (Scopus)

Özet

A high-temperature tensile study of a monolithic silicon nitride with time-of-flight neutron diffraction was presented. The sample was loaded in tension at 1375°C to 175 MPa. The stress-strain response of individual lattice reflections was used to calculate the single-crystal elastic stiffness tensor of silicon nitride at 1375°.

Orijinal dil	İngilizce
Sayfa (başlangıç-bitiş)	1039-1041
Sayfa sayısı	3
Dergi	Applied Physics Letters
Hacim	82
Basın numarası	7
DOI'lar	https://doi.org/10.1063/1.1554478
Yayın durumu	Yayınlandı - 17 Şub 2003
Harici olarak yayınlandı	Evet

Belgeye Erişim

10.1063/1.1554478

Diğer Dosyalar ve Linkler

Link to publication in Scopus

Alıntı Yap

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title = "High-temperature elastic properties of in situ-reinforced Si3N4",

abstract = "A high-temperature tensile study of a monolithic silicon nitride with time-of-flight neutron diffraction was presented. The sample was loaded in tension at 1375°C to 175 MPa. The stress-strain response of individual lattice reflections was used to calculate the single-crystal elastic stiffness tensor of silicon nitride at 1375°.",

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AU - Üstündag, Ersan

AU - Clausen, Bjørn

AU - Bourke, Mark A.M.

AU - Lin, Hua Tay

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AB - A high-temperature tensile study of a monolithic silicon nitride with time-of-flight neutron diffraction was presented. The sample was loaded in tension at 1375°C to 175 MPa. The stress-strain response of individual lattice reflections was used to calculate the single-crystal elastic stiffness tensor of silicon nitride at 1375°.

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