Fabrication of 3D-silicon micro-pillars/walls decorated with aluminum-ZnO/ZnO nanowires for optoelectric devices

Keyphrases

• Three-dimensional (3D) 100%
• Micropillar 100%
• Optoelectric Device 100%
• ZnO Nanowires 100%
• UV-VIS Spectroscopy 50%
• High Aspect Ratio 50%
• Low Voltage 50%
• Hydrothermally 50%
• Hierarchical Structure 50%
• Electrical Measurements 50%
• Reflection Loss 50%
• Deep Reactive Ion Etching 50%
• Voltage Sensing 50%
• Optical Measurement 50%
• Dense Array 50%
• Vertically Oriented 50%
• Reactive Ion Etching 50%
• ZnO Thin Films 50%
• Three-dimensional Heterostructure 50%
• Field Ionization 50%
• Ionization Process 50%
• Nano-heterojunction 50%
• Silicon Structure 50%

Material Science

• Nanowire 100%
• ZnO 100%
• Heterojunction 50%
• Thin Films 25%
• Reactive Ion Etching 25%
• Optical Measurement 25%