Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H2O2/UV: Optimization and kinetics studies

Mohsen Sheydaei; Soheil Aber; Alireza Khataee

doi:10.1016/j.jiec.2013.08.031

Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H₂O₂/UV: Optimization and kinetics studies

Mohsen Sheydaei
, Soheil Aber^*
, Alireza Khataee

^*Bu çalışma için yazışmadan sorumlu yazar

University of Tabriz

Araştırma sonucu: Dergiye katkı › Makale › bilirkişi

70 Atıf (Scopus)

Özet

Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H₂O₂/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl^-1 and initial H₂O₂ concentration of 60mgl^-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×10⁵M^-1s^-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.

Orijinal dil	İngilizce
Sayfa (başlangıç-bitiş)	1772-1778
Sayfa sayısı	7
Dergi	Journal of Industrial and Engineering Chemistry
Hacim	20
Basın numarası	4
DOI'lar	https://doi.org/10.1016/j.jiec.2013.08.031
Yayın durumu	Yayınlandı - 25 Tem 2014
Harici olarak yayınlandı	Evet

Belgeye Erişim

10.1016/j.jiec.2013.08.031

Diğer Dosyalar ve Linkler

Link to publication in Scopus

Alıntı Yap

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title = "Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H2O2/UV: Optimization and kinetics studies",

abstract = "Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl-1 and initial H2O2 concentration of 60mgl-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×105M-1s-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.",

keywords = "Iron oxide, Nanolepidocrocite, Pharmaceutics, Photo-Fenton, Response surface methodology",

author = "Mohsen Sheydaei and Soheil Aber and Alireza Khataee",

year = "2014",

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day = "25",

doi = "10.1016/j.jiec.2013.08.031",

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TY - JOUR

T1 - Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H2O2/UV

T2 - Optimization and kinetics studies

AU - Sheydaei, Mohsen

AU - Aber, Soheil

AU - Khataee, Alireza

PY - 2014/7/25

Y1 - 2014/7/25

N2 - Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl-1 and initial H2O2 concentration of 60mgl-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×105M-1s-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.

AB - Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl-1 and initial H2O2 concentration of 60mgl-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×105M-1s-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.

KW - Iron oxide

KW - Nanolepidocrocite

KW - Pharmaceutics

KW - Photo-Fenton

KW - Response surface methodology

UR - https://www.scopus.com/pages/publications/84900476034

U2 - 10.1016/j.jiec.2013.08.031

DO - 10.1016/j.jiec.2013.08.031

M3 - Article

AN - SCOPUS:84900476034

SN - 1226-086X

VL - 20

SP - 1772

EP - 1778

JO - Journal of Industrial and Engineering Chemistry

JF - Journal of Industrial and Engineering Chemistry

IS - 4