Özet
Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl-1 and initial H2O2 concentration of 60mgl-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×105M-1s-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.
Orijinal dil | İngilizce |
---|---|
Sayfa (başlangıç-bitiş) | 1772-1778 |
Sayfa sayısı | 7 |
Dergi | Journal of Industrial and Engineering Chemistry |
Hacim | 20 |
Basın numarası | 4 |
DOI'lar | |
Yayın durumu | Yayınlandı - 25 Tem 2014 |
Harici olarak yayınlandı | Evet |