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Crack healing between rough polycrystalline silicon hydrophilic surfaces in n-pentanol and water vapors

  • Emrecan Soylemez
  • , Maarten P. De Boer*
  • *Bu çalışma için yazışmadan sorumlu yazar

Araştırma sonucu: Dergiye katkıMakalebilirkişi

6 Atıf (Scopus)

Özet

Abstract The crack healing rates of polycrystalline silicon microcantilevers in contact with a substrate are measured in n-pentanol vapor at different partial pressures, p/ps. The absolute value of the slope of the logarithmic average crack healing velocity v¯ versus the energy release rate G, |d[log(v¯)]/dG|, is constant and decreases with increasing p/ps. The slope dependence on p/ps is equivalent to that in a water vapor environment. This slope is independent of p/p s in glass stress corrosion cracking experiments due to chemical kinetics, while the present experiments reflect a capillary bridge nucleation mechanism across nanometer-scale gaps created by surface roughness. Equilibrium measurements of adhesion versus p/p s are also compared for n-pentanol and water vapor. For p/p s ≤ 0.5, adhesion is comparable for the two vapors, while for p/ps > 0.5, adhesion in water vapor is approximately twice that in n-pentanol vapor. At lower p/p s, this is explained by the larger Kelvin radius and the larger adsorbed layer thickness of n-pentanol. This combination enables larger asperity gaps to be bridged by capillary liquids. At higher p/ps, adhesion in water vapor is larger because the work of adhesion of capillary bridges becomes twice that of n-pentanol.

Orijinal dilİngilizce
Makale numarası5
DergiTribology Letters
Hacim59
Basın numarası1
DOI'lar
Yayın durumuYayınlandı - 26 Tem 2015
Harici olarak yayınlandıEvet

Bibliyografik not

Publisher Copyright:
© 2015 Springer Science+Business Media New York.

Finansman

FinansörlerFinansör numarası
National Science FoundationCMMI 1030322

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