A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering

Keyphrases

• Steel Substrate 100%
• Tribological Properties 100%
• Adhesion 100%
• Plasma Enhanced 100%
• Boron Carbon Nitride 100%
• Design Study 100%
• Boron Carbide 100%
• Functionally Graded Design 100%
• DC Magnetron Sputtering 100%
• Borides 50%
• Pin-on-disc 50%
• Ti-TiC 50%
• B4 C 50%
• Nanoindentation 50%
• Graded Structure 50%
• Si Substrate 50%
• BCN Thin Films 50%
• Bond Length 50%
• Film Thickness 50%
• B-C-N 50%
• Hexagonal Boron Nitride (h-BN) 50%
• SEM Observation 50%
• Elemental Depth Profiling 50%
• Film Composition 50%
• Surface Boronizing 50%
• Mechanical Properties 50%
• Field Emission Scanning Electron Microscopy (FE-SEM) 50%
• Boron Carbonitride Films 50%
• N-systems 50%
• Cubic Boron Nitride (c-BN) 50%

Material Science

• Magnetron Sputtering 100%
• Thin Films 100%
• Carbon Nitride 100%
• Carbide 100%
• Boron 100%
• Film 75%
• Boride 25%
• Secondary Ion Mass Spectrometry 25%
• Film Thickness 25%
• Field Emission Scanning Electron Microscopy 25%
• Electron Probe Microanalyzer 25%
• Cubic Boron Nitride 25%
• Nanoindentation 25%
• Phase Composition 25%

Engineering

• Carbonitrides 100%
• Magnetron 100%
• Thin Films 100%
• Si Substrate 50%
• Pin-on-Disc 50%
• Boronizing 50%
• Phase Composition 50%