Ultra-fast boriding of nickel aluminide

O. Kahvecioglu; V. Sista; O. L. Eryilmaz; A. Erdemir; S. Timur

doi:10.1016/j.tsf.2011.08.077

Ultra-fast boriding of nickel aluminide

O. Kahvecioglu^*, V. Sista, O. L. Eryilmaz, A. Erdemir, S. Timur

^*Corresponding author for this work

Department of Metallurgical and Materials Engineering

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

In this study, we explored the possibility of ultra-fast electrochemical boriding of nickel aluminide (Ni₃Al) in a molten borax electrolyte. Electrochemical boriding was performed at 950 °C for 15 min and at current densities ranging from 0.1 to 0.5 A/cm². The boride layers formed on the test samples were 50 to 260 μm thick depending on the current density. The mechanical, structural, and chemical characterization of the boride layers was carried out using a Vickers micro-hardness test machine, optical and scanning electron microscopes, and a thin film X-ray diffractometer. The hardness of boride layer was in the range from 800 to 1200 ± 50 HV depending on the load and the region from which the hardness measurements were taken. X-ray diffraction studies confirmed that the boride layers were primarily composed of Ni₃B, Ni₄B₃ and Ni ₂₀AlB₁₄ phases. Structurally, the boride layer was very homogenous and uniformly thick across the borided surface area.

Original language	English
Pages (from-to)	1575-1581
Number of pages	7
Journal	Thin Solid Films
Volume	520
Issue number	5
DOIs	https://doi.org/10.1016/j.tsf.2011.08.077
Publication status	Published - 30 Dec 2011

Funding

The authors would like to thank the U.S. Department of Energy, Office of Energy Efficiency and Renewable Energy, ITP , under contract number DE-AC02-06CH11357 with the U.S. Department of Energy for supporting this work. The electron microscopy study was accomplished at the Electron Microscopy Center for Materials Research at Argonne National Laboratory, a U.S. Department of Energy Office of Science Laboratory operated under contract no. DE-AC02-06CH11357 by UChicago Argonne, LLC. They would also like to thank for performing the X-ray diffraction study, which was carried out in part in the Frederick Seitz Materials Research Laboratory Central Facilities, University of Illinois. The authors would like to thank Gerald Jeka for doing the microscopy imaging and helping in sample preparation.

Funders	Funder number
U.S. Department of Energy
Office of Energy Efficiency and Renewable Energy
Argonne National Laboratory
Instituto de Tecnologia e Pesquisa, Universidade Tiradentes	DE-AC02-06CH11357

Keywords

Boriding
Molten salt electrolysis
NiAlB
NiAl
NiB
NiB

Access to Document

10.1016/j.tsf.2011.08.077

Cite this

@article{c1e89f443e5441228641f8fd632be273,

title = "Ultra-fast boriding of nickel aluminide",

abstract = "In this study, we explored the possibility of ultra-fast electrochemical boriding of nickel aluminide (Ni3Al) in a molten borax electrolyte. Electrochemical boriding was performed at 950 °C for 15 min and at current densities ranging from 0.1 to 0.5 A/cm2. The boride layers formed on the test samples were 50 to 260 μm thick depending on the current density. The mechanical, structural, and chemical characterization of the boride layers was carried out using a Vickers micro-hardness test machine, optical and scanning electron microscopes, and a thin film X-ray diffractometer. The hardness of boride layer was in the range from 800 to 1200 ± 50 HV depending on the load and the region from which the hardness measurements were taken. X-ray diffraction studies confirmed that the boride layers were primarily composed of Ni3B, Ni4B3 and Ni 20AlB14 phases. Structurally, the boride layer was very homogenous and uniformly thick across the borided surface area.",

keywords = "Boriding, Molten salt electrolysis, NiAlB, NiAl, NiB, NiB",

author = "O. Kahvecioglu and V. Sista and Eryilmaz, {O. L.} and A. Erdemir and S. Timur",

year = "2011",

month = dec,

day = "30",

doi = "10.1016/j.tsf.2011.08.077",

language = "English",

volume = "520",

pages = "1575--1581",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "5",

}

TY - JOUR

T1 - Ultra-fast boriding of nickel aluminide

AU - Kahvecioglu, O.

AU - Sista, V.

AU - Eryilmaz, O. L.

AU - Erdemir, A.

AU - Timur, S.

PY - 2011/12/30

Y1 - 2011/12/30

N2 - In this study, we explored the possibility of ultra-fast electrochemical boriding of nickel aluminide (Ni3Al) in a molten borax electrolyte. Electrochemical boriding was performed at 950 °C for 15 min and at current densities ranging from 0.1 to 0.5 A/cm2. The boride layers formed on the test samples were 50 to 260 μm thick depending on the current density. The mechanical, structural, and chemical characterization of the boride layers was carried out using a Vickers micro-hardness test machine, optical and scanning electron microscopes, and a thin film X-ray diffractometer. The hardness of boride layer was in the range from 800 to 1200 ± 50 HV depending on the load and the region from which the hardness measurements were taken. X-ray diffraction studies confirmed that the boride layers were primarily composed of Ni3B, Ni4B3 and Ni 20AlB14 phases. Structurally, the boride layer was very homogenous and uniformly thick across the borided surface area.

AB - In this study, we explored the possibility of ultra-fast electrochemical boriding of nickel aluminide (Ni3Al) in a molten borax electrolyte. Electrochemical boriding was performed at 950 °C for 15 min and at current densities ranging from 0.1 to 0.5 A/cm2. The boride layers formed on the test samples were 50 to 260 μm thick depending on the current density. The mechanical, structural, and chemical characterization of the boride layers was carried out using a Vickers micro-hardness test machine, optical and scanning electron microscopes, and a thin film X-ray diffractometer. The hardness of boride layer was in the range from 800 to 1200 ± 50 HV depending on the load and the region from which the hardness measurements were taken. X-ray diffraction studies confirmed that the boride layers were primarily composed of Ni3B, Ni4B3 and Ni 20AlB14 phases. Structurally, the boride layer was very homogenous and uniformly thick across the borided surface area.

KW - Boriding

KW - Molten salt electrolysis

KW - NiAlB

KW - NiAl

KW - NiB

UR - http://www.scopus.com/inward/record.url?scp=82755182663&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2011.08.077

DO - 10.1016/j.tsf.2011.08.077

M3 - Article

AN - SCOPUS:82755182663

SN - 0040-6090

VL - 520

SP - 1575

EP - 1581

JO - Thin Solid Films

JF - Thin Solid Films

IS - 5

ER -

Ultra-fast boriding of nickel aluminide

Abstract

Funding

Keywords

Access to Document

Other files and links

Fingerprint

Cite this