Abstract
In this paper, an integrated variability and reliability analysis method based on surrogate models is introduced. The surrogate models here are response surfaces that describe a parametrized complex analytic function. Surrogate models are developed for the drain currents of 65-nm NMOS and PMOS devices in terms of critical process components, terminal voltages, temperature, and time and are based on BSIM model equations. A simulation technique is developed which incorporates the effect of process variations into the design procedure. These models and techniques are verified using circuit simulations of a single transistor and differential amplifier designs.
Original language | English |
---|---|
Article number | 5893924 |
Pages (from-to) | 466-473 |
Number of pages | 8 |
Journal | IEEE Transactions on Device and Materials Reliability |
Volume | 11 |
Issue number | 3 |
DOIs | |
Publication status | Published - Sept 2011 |
Externally published | Yes |
Keywords
- Analog circuits
- process variations
- reliability
- surrogate model
- variability