Abstract
Progress in the task of designing and fabricating super-resolving masks for three-dimensional fluorescent laser scanning microscope at high numerical aperture is presented. The technique used is an extension of that previously proved at low aperture and uses a digital binary mask for optical processing in the image plane. The computational technique for calculating the mask is reviewed.
| Original language | English |
|---|---|
| Pages (from-to) | 173-176 |
| Number of pages | 4 |
| Journal | ZAMM Zeitschrift fur Angewandte Mathematik und Mechanik |
| Volume | 76 |
| Issue number | SUPPL. 2 |
| Publication status | Published - 1996 |
| Externally published | Yes |