@inproceedings{b18b97f5b2d748a0a332da6162211276,
title = "Structural and optical properties of silicon carbonitride thin films deposited by reactive DC magnetron sputtering",
abstract = "In this study, silicon carbonitride thin films of variable compositions were deposited on glass and AISI M2 high-speed steel substrates by reactive DC magnetron sputtering of high purity silicon target using CH4 and N2 as reactive gases. The composition of the coatings was modified by the change in the reactive gas flow ratios. Microstructural properties were investigated by cross-sectional SEM analyses. Spectrophotometer was used to measure the optical transmittance and reflectance of silicon carbonitride thin films over the spectral range from 280 to 1000 nm. The optical constants and band gap values of the films were further evaluated with respect to the gas flow rate. The results of analyses and calculations provided the information about the relationship between the reactive gas flow rates, microstructure, optical constants and band gap values of silicon carbonitride films.",
keywords = "Band gap, Microstructure, Optical constants, Reactive magnetron sputtering, Silicon carbonitride, Thin film",
author = "Okan Agirseven and Tolga Tavsanoglu and {Ozkan Zayim}, Esra and Onuralp Yucel",
year = "2012",
doi = "10.1002/9781118356074.ch76",
language = "English",
isbn = "9781118296073",
series = "TMS Annual Meeting",
publisher = "Minerals, Metals and Materials Society",
pages = "595--602",
booktitle = "Materials Processing and Interfaces",
address = "United States",
note = "141st Annual Meeting and Exhibition, TMS 2012 ; Conference date: 11-03-2012 Through 15-03-2012",
}