Sputtering yield and dynamical analysis of Ni(1 0 0) surface: A comparison of four different Ar-surface interaction potentials

Ziya B. Güvenç, Yakup Hundur, Rainer Hippler

Research output: Contribution to journalConference articlepeer-review

7 Citations (Scopus)

Abstract

The sputtering process of the Ar+Ni(1 0 0) collision system is investigated by means of constant energy molecular dynamics simulations. The Ni(1 0 0) is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using four different screened Coulomb type potentials. The Ni atom emission from the lattice is analyzed over the range of 10-40 eV collision energy. The maximum penetration depths of Ar, probability distributions of kinetic energy of the reflected Ar, and energy of the Ar and sputtered Ni atoms in the same collision events are evaluated as functions of the impact energy and sputtering time. Further, angular distributions of the scattered Ar are obtained. The calculated sputtering yields are compared with the available theoretical and experimental data.

Original languageEnglish
Pages (from-to)854-860
Number of pages7
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume164
DOIs
Publication statusPublished - Apr 2000
Externally publishedYes
EventICACS-18: 18th International Conference on Atomic Collisions in Solids - Odense, Denmark
Duration: 3 Aug 19998 Aug 1999

Funding

We would like to thank the Deutsche Forschungsgemeinschaft (DFG) for partial support through SFB 198 “Kinetik partiell ionisierter Plasmen”. One of us (YH) would like to thank the Istanbul Technical University for their support.

FundersFunder number
Deutsche ForschungsgemeinschaftSFB 198

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