Scalable deposition of sol–gel based monolayer antireflective thin films by using a dual alkoxysilane precursor chemistry

Keyphrases

• Sol-gel 100%
• Alkoxysilane 100%
• Scalable Deposition 100%
• Precursor Chemistry 100%
• Antireflective Thin Film 100%
• Scanning Electron Microscopy 66%
• Coated Glass 66%
• Coating Process 66%
• Tempering Process 66%
• Tetraethyl Orthosilicate 66%
• Methyltriethoxysilane 66%
• Acetic Acid 33%
• Electron Microscopy Techniques 33%
• Annealing 33%
• Dip Coating 33%
• Thermal Stability 33%
• Nitric Acid 33%
• Annealing Temperature 33%
• Optimum Properties 33%
• Mole Ratio 33%
• Optical Microscopy 33%
• Catalyst System 33%
• Room Condition 33%
• Contact Angle Measurement 33%
• Optical Performance 33%
• Electron Beam Scanning 33%
• Chemical Resistance 33%
• External Environment 33%
• Standardized Tests 33%
• Dry Gel 33%
• PV Panel 33%
• Fourier Transform Infrared Analysis 33%
• Solid Properties 33%
• Thin Solid Films 33%
• Coating Chemistry 33%
• Soda-lime-silica Glass 33%
• Roller Coating 33%
• Scanning Transmission Electron Microscopy 33%
• Solar Module 33%
• Antireflection 33%
• Hybrid Chemistry 33%
• Colloidal Sol 33%
• IEC 61215 33%
• Mechanical Resistance 33%
• Weathering Durability 33%
• Dual Precursors 33%
• Optical Spectrophotometry 33%
• Acidic Catalyst 33%
• Antireflective Properties 33%
• Patterned Glass 33%

Material Science

• Thin Films 100%
• Monolayers 100%
• Coating Process 100%
• Tetraethyl Orthosilicate 66%
• Scanning Electron Microscopy 33%
• Contact Angle 33%
• Thermal Stability 33%
• Electron Microscopy 33%
• Silicate Glass 33%
• Chemical Resistance 33%
• Scanning Transmission Electron Microscopy 33%
• Optical Measurement 33%