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Residual stresses in (Zr,Hf)N films (up to 11.9 at.% Hf) measured by X-ray diffraction using experimentally calculated XECs
E. Atar, C. Sarioglu, H. Cimenoglu, E. S. Kayali*
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
20
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(Scopus)