Residual stresses in (Zr,Hf)N films (up to 11.9 at.% Hf) measured by X-ray diffraction using experimentally calculated XECs

E. Atar, C. Sarioglu, H. Cimenoglu, E. S. Kayali*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

In the present work, the residual stresses of (Zr,Hf)N films were measured using X-ray diffraction (XRD) fixed incident multiplane technique (FIM) for varying amounts of Hf addition by assuming the film was isotropic and anisotropic (Krönel model). The residual stress values calculated according to isotropic and anisotropic models were almost the same (-6 GPa). Addition up to 11.9 at.% Hf into ZrN films did not affect the level of residual stress.

Original languageEnglish
Pages (from-to)188-194
Number of pages7
JournalSurface and Coatings Technology
Volume191
Issue number2-3
DOIs
Publication statusPublished - 21 Feb 2005

Funding

The authors gratefully acknowledge the support of NATO TU PVD Coatings Project for the equipment supplied to the Metallurgical and Material Engineering Department of Istanbul Technical University, which was utilized in this study.

FundersFunder number
North Atlantic Treaty Organization
Istanbul Teknik Üniversitesi

    Keywords

    • Coatings
    • Residual stress
    • Thin film
    • X-ray diffraction
    • ZrN and HfN

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