Quantification of Ultraprecision Surface Morphology using an Algebraic Graph Theoretic Approach

Prahalad Rao; Satish Bukkapatnam; Zhenyu Kong; Omer Beyca; Kenneth Case; Ranga Komanduri

doi:10.1016/j.promfg.2015.09.025

Quantification of Ultraprecision Surface Morphology using an Algebraic Graph Theoretic Approach

Prahalad Rao
, Satish Bukkapatnam
, Zhenyu Kong^*
, Omer Beyca
, Kenneth Case
, Ranga Komanduri

^*Corresponding author for this work

State University of New York Binghamton University
Texas A&M University
Virginia Polytechnic Institute and State University
Fatih University
Oklahoma State University

Research output: Contribution to journal › Conference article › peer-review

7 Citations (Scopus)

Abstract

Assessment of progressive, nano-scale variation of surface morphology during ultraprecision manufacturing processes, such as fine-abrasive polishing of semiconductor wafers, is a challenging proposition owing to limitations with traditional surface quantifiers. We present an algebraic graph theoretic approach that uses graph topological invariants for quantification of ultraprecision surface morphology. The graph theoretic approach captures heterogeneous multi-scaled aspects of surface morphology from optical micrographs, and is therefore valuable for in situ real-time assessment of surface quality. Extensive experimental investigations with specular finished (Sa ∼ 5 nm) blanket copper wafers from a chemical mechanical planarization (CMP) process suggest that the proposed method was able to quantify and track variations in surface morphology more effectively than statistical quantifiers reported in literature.

Original language	English
Pages (from-to)	12-26
Number of pages	15
Journal	Procedia Manufacturing
Volume	1
DOIs	https://doi.org/10.1016/j.promfg.2015.09.025
Publication status	Published - 2015
Externally published	Yes
Event	43rd North American Manufacturing Research Conference, NAMRC 2015 - Charlotte, United States Duration: 8 Jun 2015 → 12 Jun 2015

Bibliographical note

Publisher Copyright:
© 2015 Published by Elsevier B.V.

Funding

The authors acknowledge the generous support of the NSF via the following grants: CMMI 1266331, 1437139, 1432914, 1401511, IIP 1355765, IOS 1146882. One of the authors (SB) also wishes to acknowledge AT&T Professorship (Oklahom a State University) and Rockwell International professorship (Texas A&M University) for additional support. The authors dedicate this article to the fond memory of Dr. Ranga Komanduri (1942-2011), a scholar and a mentor, whose presence would be deeply missed.

Funders	Funder number
National Science Foundation	1437139, IOS 1146882, CMMI 1266331, IIP 1355765, 1401511, 1432914

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

Fiedler number
Surface morphology quantification
chemical mechanical polishing (CMP)
copper CMP
graph theory
semiconductor wafer metrology

Access to Document

10.1016/j.promfg.2015.09.025

Cite this

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title = "Quantification of Ultraprecision Surface Morphology using an Algebraic Graph Theoretic Approach",

abstract = "Assessment of progressive, nano-scale variation of surface morphology during ultraprecision manufacturing processes, such as fine-abrasive polishing of semiconductor wafers, is a challenging proposition owing to limitations with traditional surface quantifiers. We present an algebraic graph theoretic approach that uses graph topological invariants for quantification of ultraprecision surface morphology. The graph theoretic approach captures heterogeneous multi-scaled aspects of surface morphology from optical micrographs, and is therefore valuable for in situ real-time assessment of surface quality. Extensive experimental investigations with specular finished (Sa ∼ 5 nm) blanket copper wafers from a chemical mechanical planarization (CMP) process suggest that the proposed method was able to quantify and track variations in surface morphology more effectively than statistical quantifiers reported in literature.",

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author = "Prahalad Rao and Satish Bukkapatnam and Zhenyu Kong and Omer Beyca and Kenneth Case and Ranga Komanduri",

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T1 - Quantification of Ultraprecision Surface Morphology using an Algebraic Graph Theoretic Approach

AU - Rao, Prahalad

AU - Bukkapatnam, Satish

AU - Kong, Zhenyu

AU - Beyca, Omer

AU - Case, Kenneth

AU - Komanduri, Ranga

PY - 2015

Y1 - 2015

N2 - Assessment of progressive, nano-scale variation of surface morphology during ultraprecision manufacturing processes, such as fine-abrasive polishing of semiconductor wafers, is a challenging proposition owing to limitations with traditional surface quantifiers. We present an algebraic graph theoretic approach that uses graph topological invariants for quantification of ultraprecision surface morphology. The graph theoretic approach captures heterogeneous multi-scaled aspects of surface morphology from optical micrographs, and is therefore valuable for in situ real-time assessment of surface quality. Extensive experimental investigations with specular finished (Sa ∼ 5 nm) blanket copper wafers from a chemical mechanical planarization (CMP) process suggest that the proposed method was able to quantify and track variations in surface morphology more effectively than statistical quantifiers reported in literature.

AB - Assessment of progressive, nano-scale variation of surface morphology during ultraprecision manufacturing processes, such as fine-abrasive polishing of semiconductor wafers, is a challenging proposition owing to limitations with traditional surface quantifiers. We present an algebraic graph theoretic approach that uses graph topological invariants for quantification of ultraprecision surface morphology. The graph theoretic approach captures heterogeneous multi-scaled aspects of surface morphology from optical micrographs, and is therefore valuable for in situ real-time assessment of surface quality. Extensive experimental investigations with specular finished (Sa ∼ 5 nm) blanket copper wafers from a chemical mechanical planarization (CMP) process suggest that the proposed method was able to quantify and track variations in surface morphology more effectively than statistical quantifiers reported in literature.

KW - Fiedler number

KW - Surface morphology quantification

KW - chemical mechanical polishing (CMP)

KW - copper CMP

KW - graph theory

KW - semiconductor wafer metrology

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U2 - 10.1016/j.promfg.2015.09.025

DO - 10.1016/j.promfg.2015.09.025

M3 - Conference article

AN - SCOPUS:85041636751

SN - 2351-9789

VL - 1

SP - 12

EP - 26

JO - Procedia Manufacturing

JF - Procedia Manufacturing

T2 - 43rd North American Manufacturing Research Conference, NAMRC 2015

Y2 - 8 June 2015 through 12 June 2015

ER -

Quantification of Ultraprecision Surface Morphology using an Algebraic Graph Theoretic Approach

Abstract

Bibliographical note

Funding

UN SDGs

Keywords

Access to Document

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