On the photolysis of phthalic acid dialkyl esters: a product analysis study

G. Hizal; Q. Q. Zhu; Ch H. Fischer; P. M. Fritz; W. Schnabel

doi:10.1016/1010-6030(93)85021-Y

On the photolysis of phthalic acid dialkyl esters: a product analysis study

G. Hizal, Q. Q. Zhu, Ch H. Fischer, P. M. Fritz, W. Schnabel^*

^*Corresponding author for this work

Helmholtz Centre Berlin for Materials and Energy

Research output: Contribution to journal › Article › peer-review

19 Citations (Scopus)

Abstract

The following phthalic acid dialkyl esters were subjected to UV irradiation (λ_inc = 254 nm at 22 °C or λ_inc = 240-440 nm at 40 °C): phthalic acid di(2-ethylhexyl) ester (DOP), phthalic acid di(n-octyl) ester (DNOP), phthalic acid di(n-decyl) ester (DDP) and phthalic acid dimethyl ester (DMP). In all cases (except DMP) analogous major photoproducts identified by the gas chromatography-mass spectrometry (GCMS) method are formed: 1-alkenes, alkyl alcohols, phthalic acid anhydride, 2-formyl benzoic acid esters and benzoic acid esters. Generally, the quantum yields of decomposition are quite low: φ </0.03. Extension of the linear alcohol chains decreases the stability: φ,(-DMP)<φ(-DNOP)<φ(-DDP). In the absence of O₂, DOP, which contains branches in the alcohol chains, is more stable than the isomeric DNOP containing linear alcohol chains: φ(-DOP) <φ(-DNOP).

Original language	English
Pages (from-to)	147-152
Number of pages	6
Journal	Journal of Photochemistry and Photobiology A: Chemistry
Volume	72
Issue number	2
DOIs	https://doi.org/10.1016/1010-6030(93)85021-Y
Publication status	Published - 15 May 1993
Externally published	Yes

Funding

This work was financially supported, in part, by Exxon Chemical International Inc. Our special thanks are directed to Mr. A. C. Poppe, Mr. G. de Lucca and Dr. P. Charlier.

Funders	Funder number
Exxon Chemical International Inc.

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title = "On the photolysis of phthalic acid dialkyl esters: a product analysis study",

abstract = "The following phthalic acid dialkyl esters were subjected to UV irradiation (λinc = 254 nm at 22 °C or λinc = 240-440 nm at 40 °C): phthalic acid di(2-ethylhexyl) ester (DOP), phthalic acid di(n-octyl) ester (DNOP), phthalic acid di(n-decyl) ester (DDP) and phthalic acid dimethyl ester (DMP). In all cases (except DMP) analogous major photoproducts identified by the gas chromatography-mass spectrometry (GCMS) method are formed: 1-alkenes, alkyl alcohols, phthalic acid anhydride, 2-formyl benzoic acid esters and benzoic acid esters. Generally, the quantum yields of decomposition are quite low: φ </0.03. Extension of the linear alcohol chains decreases the stability: φ,(-DMP)<φ(-DNOP)<φ(-DDP). In the absence of O2, DOP, which contains branches in the alcohol chains, is more stable than the isomeric DNOP containing linear alcohol chains: φ(-DOP) <φ(-DNOP).",

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AU - Hizal, G.

AU - Zhu, Q. Q.

AU - Fischer, Ch H.

AU - Fritz, P. M.

AU - Schnabel, W.

PY - 1993/5/15

Y1 - 1993/5/15

N2 - The following phthalic acid dialkyl esters were subjected to UV irradiation (λinc = 254 nm at 22 °C or λinc = 240-440 nm at 40 °C): phthalic acid di(2-ethylhexyl) ester (DOP), phthalic acid di(n-octyl) ester (DNOP), phthalic acid di(n-decyl) ester (DDP) and phthalic acid dimethyl ester (DMP). In all cases (except DMP) analogous major photoproducts identified by the gas chromatography-mass spectrometry (GCMS) method are formed: 1-alkenes, alkyl alcohols, phthalic acid anhydride, 2-formyl benzoic acid esters and benzoic acid esters. Generally, the quantum yields of decomposition are quite low: φ </0.03. Extension of the linear alcohol chains decreases the stability: φ,(-DMP)<φ(-DNOP)<φ(-DDP). In the absence of O2, DOP, which contains branches in the alcohol chains, is more stable than the isomeric DNOP containing linear alcohol chains: φ(-DOP) <φ(-DNOP).

AB - The following phthalic acid dialkyl esters were subjected to UV irradiation (λinc = 254 nm at 22 °C or λinc = 240-440 nm at 40 °C): phthalic acid di(2-ethylhexyl) ester (DOP), phthalic acid di(n-octyl) ester (DNOP), phthalic acid di(n-decyl) ester (DDP) and phthalic acid dimethyl ester (DMP). In all cases (except DMP) analogous major photoproducts identified by the gas chromatography-mass spectrometry (GCMS) method are formed: 1-alkenes, alkyl alcohols, phthalic acid anhydride, 2-formyl benzoic acid esters and benzoic acid esters. Generally, the quantum yields of decomposition are quite low: φ </0.03. Extension of the linear alcohol chains decreases the stability: φ,(-DMP)<φ(-DNOP)<φ(-DDP). In the absence of O2, DOP, which contains branches in the alcohol chains, is more stable than the isomeric DNOP containing linear alcohol chains: φ(-DOP) <φ(-DNOP).

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On the photolysis of phthalic acid dialkyl esters: a product analysis study

Abstract

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