Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM)

D. Westholm; J. Wei; G. Bertolini; O. Gurlu; D. Pescia; U. Ramsperger

doi:10.1109/IVNC49440.2020.9203360

Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM)

D. Westholm, J. Wei, G. Bertolini, O. Gurlu, D. Pescia, U. Ramsperger^*

^*Corresponding author for this work

Swiss Federal Institute of Technology Zurich

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Abstract

Scanning Tunneling Microscopy is performed in the conventional (tunneling) and in the field-emission regime. Images of W(110)-surfaces with and without some carbon content are taken in the constant current mode, in which the tip-target vertical distance displaces to compensate for the changes of the tunneling, respectively, field emission current. In the field emission regime, we observe tip-target displacements that are not related to the topographic contrast.

Original language	English
Title of host publication	33rd International Vacuum Nanoelectronics Conference, IVNC 2020
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781728194547
DOIs	https://doi.org/10.1109/IVNC49440.2020.9203360
Publication status	Published - Jul 2020
Externally published	Yes
Event	33rd International Vacuum Nanoelectronics Conference, IVNC 2020 - Virtual, Lyon, France Duration: 6 Jul 2020 → 7 Jul 2020

Publication series

Name	33rd International Vacuum Nanoelectronics Conference, IVNC 2020

Conference

Conference	33rd International Vacuum Nanoelectronics Conference, IVNC 2020
Country/Territory	France
City	Virtual, Lyon
Period	6/07/20 → 7/07/20

Bibliographical note

Publisher Copyright:
© 2020 IEEE.

Funding

ACKNOWLEDGMENT We thank the European Commission (SIMDALEE2: Marie Curie Initial Training Network (ITN), Grant number 606988 under FP7-PEOPLE-2013-ITN, the Swiss National Science Foundation (SNF grant number 20-134422) and the Commission for Technology and Innovation (CTI grant number 9860.1 PFNM-NM) for financial support.

Funders	Funder number
Seventh Framework Programme	606988
European Commission	FP7-PEOPLE-2013-ITN
Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung	20-134422
Kommission für Technologie und Innovation	9860.1 PFNM-NM

Keywords

Contact potential
Field Emission
Low Energy Electron microscopy
Scanning Tunneling Microscopy

Access to Document

10.1109/IVNC49440.2020.9203360

Cite this

Westholm, D., Wei, J., Bertolini, G., Gurlu, O., Pescia, D., & Ramsperger, U. (2020). Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM). In 33rd International Vacuum Nanoelectronics Conference, IVNC 2020 Article 9203360 (33rd International Vacuum Nanoelectronics Conference, IVNC 2020). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IVNC49440.2020.9203360

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title = "Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM)",

abstract = "Scanning Tunneling Microscopy is performed in the conventional (tunneling) and in the field-emission regime. Images of W(110)-surfaces with and without some carbon content are taken in the constant current mode, in which the tip-target vertical distance displaces to compensate for the changes of the tunneling, respectively, field emission current. In the field emission regime, we observe tip-target displacements that are not related to the topographic contrast.",

keywords = "Contact potential, Field Emission, Low Energy Electron microscopy, Scanning Tunneling Microscopy",

author = "D. Westholm and J. Wei and G. Bertolini and O. Gurlu and D. Pescia and U. Ramsperger",

note = "Publisher Copyright: {\textcopyright} 2020 IEEE.; 33rd International Vacuum Nanoelectronics Conference, IVNC 2020 ; Conference date: 06-07-2020 Through 07-07-2020",

year = "2020",

month = jul,

doi = "10.1109/IVNC49440.2020.9203360",

language = "English",

series = "33rd International Vacuum Nanoelectronics Conference, IVNC 2020",

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Westholm, D, Wei, J, Bertolini, G, Gurlu, O, Pescia, D & Ramsperger, U 2020, Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM). in 33rd International Vacuum Nanoelectronics Conference, IVNC 2020., 9203360, 33rd International Vacuum Nanoelectronics Conference, IVNC 2020, Institute of Electrical and Electronics Engineers Inc., 33rd International Vacuum Nanoelectronics Conference, IVNC 2020, Virtual, Lyon, France, 6/07/20. https://doi.org/10.1109/IVNC49440.2020.9203360

Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM). / Westholm, D.; Wei, J.; Bertolini, G. et al.
33rd International Vacuum Nanoelectronics Conference, IVNC 2020. Institute of Electrical and Electronics Engineers Inc., 2020. 9203360 (33rd International Vacuum Nanoelectronics Conference, IVNC 2020).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Wei, J.

AU - Bertolini, G.

AU - Gurlu, O.

AU - Pescia, D.

AU - Ramsperger, U.

PY - 2020/7

Y1 - 2020/7

N2 - Scanning Tunneling Microscopy is performed in the conventional (tunneling) and in the field-emission regime. Images of W(110)-surfaces with and without some carbon content are taken in the constant current mode, in which the tip-target vertical distance displaces to compensate for the changes of the tunneling, respectively, field emission current. In the field emission regime, we observe tip-target displacements that are not related to the topographic contrast.

AB - Scanning Tunneling Microscopy is performed in the conventional (tunneling) and in the field-emission regime. Images of W(110)-surfaces with and without some carbon content are taken in the constant current mode, in which the tip-target vertical distance displaces to compensate for the changes of the tunneling, respectively, field emission current. In the field emission regime, we observe tip-target displacements that are not related to the topographic contrast.

KW - Contact potential

KW - Field Emission

KW - Low Energy Electron microscopy

KW - Scanning Tunneling Microscopy

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U2 - 10.1109/IVNC49440.2020.9203360

DO - 10.1109/IVNC49440.2020.9203360

M3 - Conference contribution

AN - SCOPUS:85092702849

T3 - 33rd International Vacuum Nanoelectronics Conference, IVNC 2020

BT - 33rd International Vacuum Nanoelectronics Conference, IVNC 2020

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 33rd International Vacuum Nanoelectronics Conference, IVNC 2020

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ER -

Westholm D, Wei J, Bertolini G, Gurlu O, Pescia D, Ramsperger U. Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM). In 33rd International Vacuum Nanoelectronics Conference, IVNC 2020. Institute of Electrical and Electronics Engineers Inc. 2020. 9203360. (33rd International Vacuum Nanoelectronics Conference, IVNC 2020). doi: 10.1109/IVNC49440.2020.9203360

Non-topographic contrast in constant-current Scanning Field-Emission Microscopy (SFEM)

Abstract

Publication series

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Bibliographical note

Funding

Keywords

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