TY - JOUR
T1 - Magnetron sputtering in membrane fabrication and modification
T2 - Applications in gas and water treatment
AU - Delkhosh, Fatemeh
AU - Qotbi, Armaghan
AU - Hossein Behroozi, Amir
AU - Vatanpour, Vahid
N1 - Publisher Copyright:
© 2024 The Korean Society of Industrial and Engineering Chemistry
PY - 2024
Y1 - 2024
N2 - Magnetron-sputtered membranes have been an interesting candidate for water and gas treatment applications because of their controllable thickness, chemical compositions, crystalline structure, and other surface properties. Using magnetron sputtering (MS) as a reproducible and scalable deposition technique, membranes can be directed fabricated or modified through deposition of a thin layer on a support layer. The fundamental concepts, detailed processing mechanism, and various types of this technique are first outlined. Then, the applications of this technique in depositing thin films, mainly originating from polymers, metal(loid)s, oxides, and carbon, on membrane supports are briefly discussed. The next focus is on recent progress in this field by reporting the performance of MS-based developed membranes in both water and gas treatment processes, which provides a comparative study in terms of filtration efficiency. Finally, the current challenges and future directions are briefly provided for the development of next-generation magnetron-sputtered membranes.
AB - Magnetron-sputtered membranes have been an interesting candidate for water and gas treatment applications because of their controllable thickness, chemical compositions, crystalline structure, and other surface properties. Using magnetron sputtering (MS) as a reproducible and scalable deposition technique, membranes can be directed fabricated or modified through deposition of a thin layer on a support layer. The fundamental concepts, detailed processing mechanism, and various types of this technique are first outlined. Then, the applications of this technique in depositing thin films, mainly originating from polymers, metal(loid)s, oxides, and carbon, on membrane supports are briefly discussed. The next focus is on recent progress in this field by reporting the performance of MS-based developed membranes in both water and gas treatment processes, which provides a comparative study in terms of filtration efficiency. Finally, the current challenges and future directions are briefly provided for the development of next-generation magnetron-sputtered membranes.
KW - Gas separation
KW - Magnetron sputtering
KW - Membrane process
KW - Surface modification
KW - Water filtration
UR - http://www.scopus.com/inward/record.url?scp=85202879986&partnerID=8YFLogxK
U2 - 10.1016/j.jiec.2024.08.052
DO - 10.1016/j.jiec.2024.08.052
M3 - Review article
AN - SCOPUS:85202879986
SN - 1226-086X
JO - Journal of Industrial and Engineering Chemistry
JF - Journal of Industrial and Engineering Chemistry
ER -