Lasing at 1065 nm in bulk Nd3+-doped telluride-tungstate glass

Hamit Kalaycioglu, Huseyin Cankaya, Gonul Ozen, Lutfu Ovecoglu, Alphan Sennaroglu*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

61 Citations (Scopus)

Abstract

We have achieved, for the first time to our knowledge, lasing in a new type of telluride-tungstate glass host doped with neodymium: Nd3+:(0.8)TeO2-(0.2)WO3. Lasing was obtained at 1065 nm with two samples containing 0.5 mol% and 1.0 mol% Nd2O3. During gain-switched operation, slope efficiencies of 12% and 10% were obtained with the 0.5 mol% and 1.0 mol% doped samples, respectively, at a pulse repetition rate of 1 kHz. Judd-Ofelt analysis was further employed to determine the emission cross section σe at 1065 nm from the absorption spectra and lifetime data. The emission cross section from the Judd-Ofelt analysis came to 3.23 ± 0.09 × 10-20 cm2, in reasonable agreement with the value of 2.0 ± 0.13 × 10-20 cm2 obtained from the analysis of laser threshold data.

Original languageEnglish
Pages (from-to)6056-6060
Number of pages5
JournalOptics Communications
Volume281
Issue number24
DOIs
Publication statusPublished - 15 Dec 2008

Fingerprint

Dive into the research topics of 'Lasing at 1065 nm in bulk Nd3+-doped telluride-tungstate glass'. Together they form a unique fingerprint.

Cite this