Influence of structural changes on electrical properties of Al:ZnO films

Osman Urper, Nilgun Baydogan*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

This paper presents a study of Al-doped ZnO films deposited at room temperature by a cost-effective sol-gel dip-coating technique. The influence of Al concentration on crystallinity, electrical and optical properties of films annealed in nitrogen and oxygen atmosphere has been studied. The resistivity has been decreased from 1.1–1.6 × 10−4 Ω.cm to 0.73–0.93 × 10−4 Ω.cm with the increase of Al concentration from 0,8 to 1,2 at. %, respectively. Transmission spectrum displays that optical transmittance has been displayed between 85% and 90% by increasing Al concentration.

Original languageEnglish
Article number126641
JournalMaterials Letters
Volume258
DOIs
Publication statusPublished - 1 Jan 2020

Bibliographical note

Publisher Copyright:
© 2019 Elsevier B.V.

Funding

Authors thank to Prof. Dr. Huseyin CIMENOGLU for his support about fabrication process at laboratory in Materials Engineering, ITU, Turkey. This work was financially supported by ITU Scientific Research Projects Foundation, BAP, Turkey, Project No: 41978 for Ph.D. Thesis. Authors thank to Prof. Dr. Huseyin CIMENOGLU for his support about fabrication process at laboratory in Materials Engineering, ITU, Turkey . This work was financially supported by ITU Scientific Research Projects Foundation, BAP, Turkey, Project No: 41978 for Ph.D. Thesis.

FundersFunder number
ITU Scientific Research Projects Foundation41978
British Association for Psychopharmacology

    Keywords

    • Optoelectronic
    • Sol-gel
    • Structural characterization
    • Thin films

    Fingerprint

    Dive into the research topics of 'Influence of structural changes on electrical properties of Al:ZnO films'. Together they form a unique fingerprint.

    Cite this