H2O2/UV-C oxidation of potential endocrine disrupting compounds: A case study with dimethyl phthalate

Tugba Olmez-Hanci*, Ceren Imren, Idil Arslan-Alaton, Işinok Kabdaşlino, Olcay Tünay

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

35 Citations (Scopus)

Abstract

This paper discusses the feasibility of the ultraviolet radiation-hydrogen peroxide (H2O2/UV-C) process as an advanced oxidation process (AOP) in the treatment of endocrine disrupting compounds (EDC). Dimethyl phthalate (DMP) was chosen as the model compound owing to its classification as an EDC. Experiments have been conducted at various pH values (3.5, 6.0 and 9.0) and initial H2O2 concentrations (0-60 mM) in a batch reactor equipped with a low-pressure mercury UV-C lamp in order to evaluate the optimal operation conditions of the H2O2/UV-C process. The most effective pH value for the degradation of DMP by H2O 2/UV-C treatment was found as 6.0. DMP abatement increased with increasing H2O2 concentrations from 5 to 30 mM. Further increase in initial H2O2 concentration, however, reduced both the rate and extent of DMP removal as well as chemical oxygen demand (COD) and total organic carbon (TOC) removals. A simple kinetic model was proposed for DMP, COD and TOC abatements confirmed pseudo-first-order reaction. The electrical energy per order (EE/O) values for DMP oxidation and TOC mineralization were calculated as 3.3 and 19 kWh m-3 order -1 respectively for the optimum treatment conditions (H 2O2,o = 30 mM, pHo = 6.0, DMPo= 100 mg L-1). Inhibition of oxygen uptake rate by activated sludge (ISO 8192) was evaluated as a tool for assessing the acute toxicity of untreated and H2O2/UV-C treated DMP. According to the results obtained in this work, the use of the H2O2/UV-C process is recommended to achieve a complete DMP oxidation and high mineralization degree of aqueous solution of DMP.

Original languageEnglish
Pages (from-to)620-627
Number of pages8
JournalPhotochemical and Photobiological Sciences
Volume8
Issue number5
DOIs
Publication statusPublished - 2009

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