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Growth kinetics of titanium borides produced by CRTD-Bor method
G. Kartal
*
,
S. Timur
*
Corresponding author for this work
Department of Metallurgical and Materials Engineering
Research output
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Contribution to journal
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Article
›
peer-review
41
Citations (Scopus)
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Keyphrases
Borides
100%
Cathodic Reduction
100%
Reduction-diffusion
100%
Thermal Diffusion
100%
Diffusion-based
100%
TiB2
100%
Titanium Diboride
100%
Growth Kinetics
100%
Boride Layer
33%
Rutile
33%
X-ray Diffraction Method
16%
Empirical Formula
16%
Constant Current Density
16%
CRTD-Bor
16%
Boriding Process
16%
Electrolyte
16%
Layer Formation
16%
Titanium Substrate
16%
Borax
16%
Activation Energy
16%
Processing Temperature
16%
TiB Whiskers
16%
Pre-exponential Factor
16%
Chemical State
16%
Morphological States
16%
Engineering
Boriding
100%
Growth Kinetics
100%
Thermal Diffusion
100%
Process Parameter
25%
Activation Energy
25%
Mols
25%
Ray Diffraction Technique
25%
Pre-Exponential Factor
25%
Immunology and Microbiology
Thermal Diffusion
100%
Morphology
50%
X Ray Diffraction
50%
Current Density
50%