Ferromagnetic Properties of Silicon Doped Manganese Atoms

N. F. Zikrillaev, S. V. Koveshnikov, Levent Trabzon, G. Kh Mavlonov, B. K. Ismaylov, T. B. Ismailov*, F. E. Urakova

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Abstract: The study of the ferromagnetic properties of silicon diffusion-doped with manganese impurity atoms makes it possible to determine the magnetic properties of this material. Depending on the technology of obtaining such samples, manganese may be located predominantly in the nodes or interstices of the silicon crystal lattice. It has been established that observations of the ferromagnetic properties of silicon are mainly related to the concentration of holes and the exchange interaction of holes in silicon. The study showed that the d-shell of manganese atoms can be filled with electrons, which leads to the appearance of the magnetic property of silicon doped with manganese atoms. The obtained research results showed a possibility to obtain a magnetic material with ferro-magnetic properties based on silicon doped with manganese impurity atoms, which can be widely used in the creation of spintronic devices in magnetoelectronics.

Original languageEnglish
Pages (from-to)75-80
Number of pages6
JournalSurface Engineering and Applied Electrochemistry
Volume61
Issue number1
DOIs
Publication statusPublished - Feb 2025

Bibliographical note

Publisher Copyright:
© Allerton Press, Inc. 2025.

Keywords

  • diffusion
  • hysteresis
  • impurity
  • manganese
  • nanocluster
  • silicon

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