Evaluation of optical properties of the amorphous carbon film on fused silica

Nilgün Doǧan Baydoǧan*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

36 Citations (Scopus)

Abstract

Deposition was done using a pulsed filtered cathodic arc with a graphite cathode. The carbon plasma is fully ionised and condenses on the substrate, forming diamond-like material but with amorphous structure. Optical properties of amorphous carbon films on fused-silica glass were investigated and the curves of optical density have a characteristic band at approximately 950nm. Changes of the colourimetric quantities were evaluated and compared to uncoated fused silica glass. These changes were investigated as a function of the applied substrate bias voltage using the CIE and CIELAB colour systems. It is suggested that the mechanism of absorption is related to an allowed direct transition at the amorphous carbon films on fused silica glass. The optical energy gap of the amorphous carbon film depends on the bias voltage applied to the substrate holder. The optical colour parameters and optical band gap indicated that there is a relation between the dominant wavelength of the reflectance in the visible range and the wavelength of the optical band gap.

Original languageEnglish
Pages (from-to)70-77
Number of pages8
JournalMaterials Science and Engineering: B
Volume107
Issue number1
DOIs
Publication statusPublished - 25 Feb 2004

Funding

Experiments for this research were done at Lawrence Berkeley National Laboratory, Berkeley, California, as part of a post-doctoral research visit. The experiment was suggested by Dr. A. Anders, and his guidance is gratefully acknowledged. Thanks go also to J. Slack and Dr. R. Powles for their help with optical measurements. This work was supported by the post-doctoral fellowship program of the Istanbul Technical University Foundation.

FundersFunder number
Istanbul Technical University Foundation

    Keywords

    • Carbon
    • Film deposition
    • Optical properties
    • Plasma processing
    • Thin films

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