Energy dissipation in atomic force microscopy and atomic loss processes

Peter M. Hoffmann; Steve Jeffery; John B. Pethica; H. Ã-zgur Ã-zer; Ahmet Oral

Energy dissipation in atomic force microscopy and atomic loss processes

Peter M. Hoffmann^*, Steve Jeffery, John B. Pethica, H. Ã-zgur Ã-zer, Ahmet Oral

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

106 Citations (Scopus)

Abstract

Atomic scale dissipation measurements with a linearized, ultrasmall amplitude atomic force microscope capable of measuring dissipation at chosen, fixed separations were presented. The dc hysteresis associated with nanoscale plasticity in the contact regime was observed. It was shown that the dynamic dissipation is of the order of a few 10-100 meV per cycle in the non-contact regime. Analyzation revealed that the hysteresis energy loss was found to be 1 order of magnitude higher for a silicon surface than for copper.

Original language	English
Article number	265502
Pages (from-to)	2655021-2655024
Number of pages	4
Journal	Physical Review Letters
Volume	87
Issue number	26
Publication status	Published - 24 Dec 2001
Externally published	Yes

Cite this

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title = "Energy dissipation in atomic force microscopy and atomic loss processes",

abstract = "Atomic scale dissipation measurements with a linearized, ultrasmall amplitude atomic force microscope capable of measuring dissipation at chosen, fixed separations were presented. The dc hysteresis associated with nanoscale plasticity in the contact regime was observed. It was shown that the dynamic dissipation is of the order of a few 10-100 meV per cycle in the non-contact regime. Analyzation revealed that the hysteresis energy loss was found to be 1 order of magnitude higher for a silicon surface than for copper.",

author = "Hoffmann, {Peter M.} and Steve Jeffery and Pethica, {John B.} and {{\~A}-zgur {\~A}-zer}, H. and Ahmet Oral",

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T1 - Energy dissipation in atomic force microscopy and atomic loss processes

AU - Hoffmann, Peter M.

AU - Jeffery, Steve

AU - Pethica, John B.

AU - Ã-zgur Ã-zer, H.

AU - Oral, Ahmet

PY - 2001/12/24

Y1 - 2001/12/24

N2 - Atomic scale dissipation measurements with a linearized, ultrasmall amplitude atomic force microscope capable of measuring dissipation at chosen, fixed separations were presented. The dc hysteresis associated with nanoscale plasticity in the contact regime was observed. It was shown that the dynamic dissipation is of the order of a few 10-100 meV per cycle in the non-contact regime. Analyzation revealed that the hysteresis energy loss was found to be 1 order of magnitude higher for a silicon surface than for copper.

AB - Atomic scale dissipation measurements with a linearized, ultrasmall amplitude atomic force microscope capable of measuring dissipation at chosen, fixed separations were presented. The dc hysteresis associated with nanoscale plasticity in the contact regime was observed. It was shown that the dynamic dissipation is of the order of a few 10-100 meV per cycle in the non-contact regime. Analyzation revealed that the hysteresis energy loss was found to be 1 order of magnitude higher for a silicon surface than for copper.

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M3 - Article

AN - SCOPUS:0035945151

SN - 0031-9007

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EP - 2655024

JO - Physical Review Letters

JF - Physical Review Letters

IS - 26

M1 - 265502

ER -

Energy dissipation in atomic force microscopy and atomic loss processes

Abstract

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