Energy dissipation in atomic force microscopy and atomic loss processes

Peter M. Hoffmann*, Steve Jeffery, John B. Pethica, H. Ã-zgur Ã-zer, Ahmet Oral

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

105 Citations (Scopus)

Abstract

Atomic scale dissipation measurements with a linearized, ultrasmall amplitude atomic force microscope capable of measuring dissipation at chosen, fixed separations were presented. The dc hysteresis associated with nanoscale plasticity in the contact regime was observed. It was shown that the dynamic dissipation is of the order of a few 10-100 meV per cycle in the non-contact regime. Analyzation revealed that the hysteresis energy loss was found to be 1 order of magnitude higher for a silicon surface than for copper.

Original languageEnglish
Article number265502
Pages (from-to)2655021-2655024
Number of pages4
JournalPhysical Review Letters
Volume87
Issue number26
Publication statusPublished - 24 Dec 2001
Externally publishedYes

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