Electrochromic properties of sputtered Ni oxide thin films in neutral KCl electrolytes

Yoshio Abe*, Se Hee Lee, Esra Ozkan Zayim, C. Edwin Tracy, J. Roland Pitts, Satyen K. Deb

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

Thin films of Ni oxide, a promising anodic electrochromic material, were deposited by reactive radio frequency (rf) sputtering at 40, 60, and 100 W, and their electrochemical and electrochromic properties were examined using neutral KCl electrolytes. Higher charge capacity and higher optical modulation were obtained for a Ni oxide film deposited at low sputtering power and low deposition rate. Electrochromic coloration efficiencies of ∼30cm 2/C were obtained for all the Ni oxide films in KCl regardless of rf power value.

Original languageEnglish
Pages (from-to)G17-G18
JournalElectrochemical and Solid-State Letters
Volume9
Issue number1
DOIs
Publication statusPublished - 2006

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