Effect of Al concentration on optical parameters of ZnO thin film derived by Sol-Gel dip coating technique


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Pure and Aluminum doped zinc oxide (Al:ZnO) film samples were deposited by the sol–gel dip-coating technique for understand influence of Al concentration on the films crystallization, electrical conductivity and optical transparency. Surface morphology of the film with hexagonal wurtize crystalline structure and high c-axis orientation (in XRD analysis) displayed nanospherical particals (in SEM images). The surface roughness and average grain size increased with Al amount rise in the Al/Zn ratio. The film displayed high transparency (~90%) between 300 and 800 nm for pure and 1, 3 at.% Al concentration levels. The energy band gap, refractive index, and extinction coefficient were affected slightly due to the increasing Al concentration and optical parameters attain gently a maximum value at 3 at.% Al content.

Original languageEnglish
Article number128000
JournalMaterials Letters
Publication statusPublished - 1 Sept 2020

Bibliographical note

Publisher Copyright:
© 2020 Elsevier B.V.


This study was financially supported by Istanbul Technical University (ITU) Scientific Research Projects Foundation (BAP) with Project No: MDK-2019-41978 for Ph. D. Thesis in Istanbul, Turkey.

FundersFunder number
Scientific Research Projects Foundation
British Association for Psychopharmacology
Istanbul Teknik Üniversitesi
Bilimsel Araştırma Projeleri Birimi, İstanbul Teknik ÜniversitesiMDK-2019-41978


    • Al:ZnO
    • Dip coating
    • Sol–gel
    • Thin film


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