TY - JOUR
T1 - Dynamical analysis of sputtering at threshold energy range
T2 - Modelling of Ar+Ni(100) collision system
AU - Hundur, Yakup
AU - Güvenç, Ziya B.
AU - Hippler, Rainer
PY - 2008/2/1
Y1 - 2008/2/1
N2 - The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data.
AB - The sputtering process of Ar+Ni(100) collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni(100) slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data.
UR - http://www.scopus.com/inward/record.url?scp=42649118102&partnerID=8YFLogxK
U2 - 10.1088/0256-307X/25/2/102
DO - 10.1088/0256-307X/25/2/102
M3 - Article
AN - SCOPUS:42649118102
SN - 0256-307X
VL - 25
SP - 730
EP - 733
JO - Chinese Physics Letters
JF - Chinese Physics Letters
IS - 2
ER -