Development of experimental design models to predict Photo-Fenton oxidation of a commercially important naphthalene sulfonate and its organic carbon content

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Abstract

In the present study, Photo-Fenton oxidation of the commercially important K-acid (2-naphthylamine-3,6,8-trisulfonic acid) was optimized and modeled by employing response surface methodology and central composite design. The experimental design tool was used to assess the influence of treatment time (tr), initial COD of aqueous K-acid solutions (CODo) as well as H2O2 and Fe2+ concentrations on K-acid, COD and TOC removal efficiencies. According to the established second-order polynomial regression models, K-acid removal efficiency was affected by the process variables in the following decreasing order; tr>CODo (negative impact)>Fe2+>H2O2, while the effect on COD and TOC removals was CODo (negative impact)>H2O2>tr>Fe2+. Analysis of variance indicated that the experimental design models obtained for the Photo-Fenton oxidation of aqueous K-acid and its organic carbon content (expressed as COD and TOC) were statistically significant and satisfactorily described the treatment process for the entire Photo-Fenton treatment period (up to 125min) as well as different treatment targets (partial and full oxidation) and initial COD values (150-750mg/L). Complete K-acid removal accompanied with high COD (70-100%) and TOC (55-100%) abatements were achieved under relatively mild Photo-Fenton treatment conditions.

Original languageEnglish
Pages (from-to)597-606
Number of pages10
JournalChemical Engineering Journal
Volume165
Issue number2
DOIs
Publication statusPublished - 1 Dec 2010

Funding

The authors acknowledge the financial support of the Scientific and Technological Research Council of Turkey (TUBITAK) under project number 108Y051 and Eksoy Chemicals for the K-acid samples.

FundersFunder number
TUBITAK108Y051
Türkiye Bilimsel ve Teknolojik Araştirma Kurumu

    Keywords

    • Advanced oxidation processes
    • Central composite design
    • K-acid
    • Naphthalene sulfonates
    • Photo-Fenton treatment
    • Response surface methodology

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