Deposition and characterization of tungsten carbide thin films by DC magnetron sputtering for wear-resistant applications

Keyphrases

• DC Magnetron Sputtering 100%
• Tungsten Carbide 100%
• Carbide Thin Films 100%
• Wear Resistant Applications 100%
• Bias Voltage 40%
• Tribological Properties 20%
• Mechanical Properties 20%
• Chemical Composition 20%
• Microstructure 20%
• Phase Transformation 20%
• Scanning Electron Microscope 20%
• Tungsten 20%
• Friction Coefficient 20%
• Wear Test 20%
• Elastic Modulus 20%
• Wear Resistance 20%
• Cobalt 20%
• Phase Analysis 20%
• X-ray Diffractometer 20%
• Electron Probe Microanalyzer 20%
• Carbide Phase 20%
• Coefficient Value 20%
• Nanoindentation Test 20%
• AISI M2 20%
• High Speed Steel 20%
• Non-stoichiometric 20%
• Direct Current Magnetron Sputtering 20%
• Binding Materials 20%
• Si (100) Substrate 20%
• Field Emission Gun 20%

Engineering

• Magnetron 100%
• Thin Films 100%
• Bias Voltage 66%
• Micrograph 33%
• Wear Resistance 33%
• Constant Temperature 33%
• Phase Analysis 33%
• High-Speed Steel 33%
• Electron Probe Micro Analyzer 33%
• Field Emission 33%
• Scanning Electron Microscope 33%
• Friction Coefficient 33%
• Coefficient of Friction 33%
• Modulus of Elasticity 33%
• Direct Current 33%

Material Science

• Magnetron Sputtering 100%
• Thin Films 100%
• Carbide 100%
• Tungsten 100%
• Film 50%
• Electron Probe Microanalyzer 16%
• Nanoindentation 16%
• Scanning Electron Microscopy 16%
• Elastic Moduli 16%
• Wear Resistance 16%
• Cobalt 16%
• High Speed Steel 16%
• Phase Composition 16%