Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H2O2/UV: Optimization and kinetics studies

Mohsen Sheydaei; Soheil Aber; Alireza Khataee

doi:10.1016/j.jiec.2013.08.031

Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H₂O₂/UV: Optimization and kinetics studies

Mohsen Sheydaei
, Soheil Aber^*
, Alireza Khataee

^*Corresponding author for this work

University of Tabriz

Research output: Contribution to journal › Article › peer-review

69 Citations (Scopus)

Abstract

Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H₂O₂/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl^-1 and initial H₂O₂ concentration of 60mgl^-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×10⁵M^-1s^-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.

Original language	English
Pages (from-to)	1772-1778
Number of pages	7
Journal	Journal of Industrial and Engineering Chemistry
Volume	20
Issue number	4
DOIs	https://doi.org/10.1016/j.jiec.2013.08.031
Publication status	Published - 25 Jul 2014
Externally published	Yes

Keywords

Iron oxide
Nanolepidocrocite
Pharmaceutics
Photo-Fenton
Response surface methodology

Access to Document

10.1016/j.jiec.2013.08.031

Cite this

@article{33c2bf18611948d9a7a25fa51237a356,

title = "Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H2O2/UV: Optimization and kinetics studies",

abstract = "Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl-1 and initial H2O2 concentration of 60mgl-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×105M-1s-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.",

keywords = "Iron oxide, Nanolepidocrocite, Pharmaceutics, Photo-Fenton, Response surface methodology",

author = "Mohsen Sheydaei and Soheil Aber and Alireza Khataee",

year = "2014",

month = jul,

day = "25",

doi = "10.1016/j.jiec.2013.08.031",

language = "English",

volume = "20",

pages = "1772--1778",

journal = "Journal of Industrial and Engineering Chemistry",

issn = "1226-086X",

publisher = "Korean Society of Industrial Engineering Chemistry",

number = "4",

}

TY - JOUR

T1 - Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H2O2/UV

T2 - Optimization and kinetics studies

AU - Sheydaei, Mohsen

AU - Aber, Soheil

AU - Khataee, Alireza

PY - 2014/7/25

Y1 - 2014/7/25

N2 - Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl-1 and initial H2O2 concentration of 60mgl-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×105M-1s-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.

AB - Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl-1 and initial H2O2 concentration of 60mgl-1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×105M-1s-1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.

KW - Iron oxide

KW - Nanolepidocrocite

KW - Pharmaceutics

KW - Photo-Fenton

KW - Response surface methodology

UR - https://www.scopus.com/pages/publications/84900476034

U2 - 10.1016/j.jiec.2013.08.031

DO - 10.1016/j.jiec.2013.08.031

M3 - Article

AN - SCOPUS:84900476034

SN - 1226-086X

VL - 20

SP - 1772

EP - 1778

JO - Journal of Industrial and Engineering Chemistry

JF - Journal of Industrial and Engineering Chemistry

IS - 4

ER -

Degradation of amoxicillin in aqueous solution using nanolepidocrocite chips/H₂O₂/UV: Optimization and kinetics studies

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this