Comparison of processing parameter effects during magnetron sputtering and electrochemical anodization of TiO₂nanotubes on ITO/glass and glass substrates

Titanium thin films were deposited on glass and indium tin oxide (ITO) coated glass substrates by radio-frequency (RF) magnetron sputtering under varying sputtering parameters as: power, pressure, substrate temperature and target-substrate distance. The crystalline structure, crystallite size and texture coefficients of the films were evaluated in detail. As the evaluation points out, 100 W, 1.33 Pa ambient temperature and 70 mm were determined as the optimum sputtering parameters for intended crystalline structures. Subsequently, electrochemical anodization experiments were performed via varied electrolytes and under various anodization parameters (voltage, time and electrolyte type) in a twoelectrode electrochemical cell using the films obtained through the optimized sputtering parameters. The anodized samples were annealed at 450 °C for 1 h in air in order to obtain anatase transformation and the desired crystalline structure. The surface morphologies and the crystalline structures of the anodized films were evaluated through x-ray diffractometer (XRD) and scanning electron microscope (SEM), respectively. Finally, the anodization parameters for the formation of TiO2 nanotube arrays were determined as: 35 V and 35 min. in an electrolyte composed of 0.3 wt.-% NH4F - 2 wt.-% water - ethylene glycol.