Block copolymers of cyclohexene oxide and ketonic resins via condensation and promoted cationic polymerization

Selin Ergun, Nilgün Kizilcan*, Ayşen Önen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

Block copolymers of cyclohexene oxide (CHO) and ketonic resin were prepared by using ketonic resins as free radical photoinitiators via two-step procedure. In the first step, cyclohexanone - formaldehyde and acetophenone - formaldehyde resins were modified during their preparation with benzoin and benzoin isobutyl ether. Then, AB or ABA type block copolymers depending on the resin employed were obtained by irradiation of these resins in the presence of pyridinium salt and CHO as a cationically polymerizable monomer. By this way, block copolymers of CHO with ketonic resin were prepared and characterized by GPC, DCS, FTIR, and 1H NMR spectral measurements.

Original languageEnglish
Pages (from-to)1012-1017
Number of pages6
JournalJournal of Applied Polymer Science
Volume105
Issue number3
DOIs
Publication statusPublished - 5 Aug 2007

Keywords

  • Block copolymers
  • Cationic polymerization
  • Irradiation
  • Photopolymerization
  • Resins

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