TY - JOUR
T1 - Advanced oxidation of a commercially important nonionic surfactant
T2 - Investigation of degradation products and toxicity
AU - Karci, Akin
AU - Arslan-Alaton, Idil
AU - Bekbolet, Miray
PY - 2013/12/15
Y1 - 2013/12/15
N2 - The evolution of degradation products and changes in acute toxicity during advanced oxidation of the nonionic surfactant nonylphenol decaethoxylate (NP-10) with the H2O2/UV-C and photo-Fenton processes were investigated. H2O2/UV-C and photo-Fenton processes ensured complete removal of NP-10, which was accompanied by the generation of polyethylene glycols with 3-8 ethoxy units. Formation of aldehydes and low carbon carboxylic acids was evidenced. According to the acute toxicity tests carried out with Vibrio fischeri, degradation products being more inhibitory than the original NP-10 solution were formed after the H2O2/UV-C process, whereas the photo-Fenton process appeared to be toxicologically safer since acute toxicity did not increase relative to the original NP-10 solution after treatment. Temporal evolution of the acute toxicity was strongly correlated with the identified carboxylic acids being formed during the application of H2O2/UV-C and photo-Fenton processes.
AB - The evolution of degradation products and changes in acute toxicity during advanced oxidation of the nonionic surfactant nonylphenol decaethoxylate (NP-10) with the H2O2/UV-C and photo-Fenton processes were investigated. H2O2/UV-C and photo-Fenton processes ensured complete removal of NP-10, which was accompanied by the generation of polyethylene glycols with 3-8 ethoxy units. Formation of aldehydes and low carbon carboxylic acids was evidenced. According to the acute toxicity tests carried out with Vibrio fischeri, degradation products being more inhibitory than the original NP-10 solution were formed after the H2O2/UV-C process, whereas the photo-Fenton process appeared to be toxicologically safer since acute toxicity did not increase relative to the original NP-10 solution after treatment. Temporal evolution of the acute toxicity was strongly correlated with the identified carboxylic acids being formed during the application of H2O2/UV-C and photo-Fenton processes.
KW - Acute toxicity
KW - Degradation product
KW - Nonylphenol decaethoxylate (NP-10)
KW - Photo-Fenton process
UR - http://www.scopus.com/inward/record.url?scp=84889095939&partnerID=8YFLogxK
U2 - 10.1016/j.jhazmat.2013.03.052
DO - 10.1016/j.jhazmat.2013.03.052
M3 - Article
C2 - 23608751
AN - SCOPUS:84889095939
SN - 0304-3894
VL - 263
SP - 275
EP - 282
JO - Journal of Hazardous Materials
JF - Journal of Hazardous Materials
ER -