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A ReaxFF Force Field for 2D-WS2and Its Interaction with Sapphire

  • Nadire Nayir
  • , Yun Kyung Shin
  • , Yuanxi Wang
  • , Mert Y. Sengul
  • , Danielle Reifsnyder Hickey
  • , Mikhail Chubarov
  • , Tanushree H. Choudhury
  • , Nasim Alem
  • , Joan Redwing
  • , Vincent H. Crespi
  • , Adri C.T. Van Duin*
  • *Corresponding author for this work
  • Pennsylvania State Univ.
  • Pennsylvania State University
  • Karamanoglu Mehmetbey University
  • University of Maryland, Baltimore

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

We present a new ReaxFF reactive force field parameter set enabling large-scale computational synthesis and characterization of 2D-WS2, guided by an extensive quantum mechanical data set on both periodic and nonperiodic systems and validated against ADF-STEM experiments. This potential is designed to capture the most essential features of a WS2 thin film, such as the 2H → 1T displacive phase transition, S-vacancy migration, and the energetics of various point and line defects, e.g., ripplocations in a WS2 monolayer, thus enabling cost-effective simulations supporting phase and defect engineering of 2D-WS2. Additionally, the new ReaxFF description accurately describes the nucleation of a finite 1T phase on the 2H basal plane or edges, the rotational and translational grain boundaries, and the coupled effect of chemical potential and edge stability on the formation of S- and W-oriented grain boundaries. Because the epitaxial relationship between the substrate and 2D flakes plays a key role in controlling the growth direction and thus the crystal quality of a 2D film, this potential is trained further for the WS2/sapphire interface and therefore can provide valuable insights into the morphological changes observed in a coalesced WS2 grown film on sapphire.

Original languageEnglish
Pages (from-to)17950-17961
Number of pages12
JournalJournal of Physical Chemistry C
Volume125
Issue number32
DOIs
Publication statusPublished - 19 Aug 2021
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2021 American Chemical Society. All rights reserved.

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