A new photopolymerization system for vinyl monomers

Nesrin Öz; Ahmet Akar

doi:10.1002/app.10264

A new photopolymerization system for vinyl monomers

Nesrin Öz, Ahmet Akar^*

^*Corresponding author for this work

Department of Chemistry

Istanbul Technical University

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A mixture of Ce⁺³ salt and an aminomethylene phosphonic acid, such as amino tri(methylene phosphonic acid) (ATMP), diethylene triamine penta(methylene phosphonic acid), N,N-di(methylene phosphonic acid) ethanol amine, N,N-di(methylene phosphonic acid)-N-methylamine, N-oxo-N,N,N-tri(methylene phosphonic acid), or 1-hydroxy-ethylidene-1,1-diphosphonic acid, was used for the photopolymerization of acrylonitrile, vinyl acetate, acrylic acid, and styrene in water. Molecular weights of the polymers decreased with increasing concentration of both Ce⁺³ salt and ATMP. The effect of oxygen, light, pH, and the addition order on polymerization were also studied.

Original language	English
Pages (from-to)	2494-2499
Number of pages	6
Journal	Journal of Applied Polymer Science
Volume	83
Issue number	11
DOIs	https://doi.org/10.1002/app.10264
Publication status	Published - 14 Mar 2002

Keywords

Aminomethylene phosphonic acid
Cerious salt
Organophosphorous compounds
Photopolymerization
Vinyl monomers

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10.1002/app.10264

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@article{80a44a569072400c91e523d975a3a729,

title = "A new photopolymerization system for vinyl monomers",

abstract = "A mixture of Ce+3 salt and an aminomethylene phosphonic acid, such as amino tri(methylene phosphonic acid) (ATMP), diethylene triamine penta(methylene phosphonic acid), N,N-di(methylene phosphonic acid) ethanol amine, N,N-di(methylene phosphonic acid)-N-methylamine, N-oxo-N,N,N-tri(methylene phosphonic acid), or 1-hydroxy-ethylidene-1,1-diphosphonic acid, was used for the photopolymerization of acrylonitrile, vinyl acetate, acrylic acid, and styrene in water. Molecular weights of the polymers decreased with increasing concentration of both Ce+3 salt and ATMP. The effect of oxygen, light, pH, and the addition order on polymerization were also studied.",

keywords = "Aminomethylene phosphonic acid, Cerious salt, Organophosphorous compounds, Photopolymerization, Vinyl monomers",

author = "Nesrin {\"O}z and Ahmet Akar",

year = "2002",

month = mar,

day = "14",

doi = "10.1002/app.10264",

language = "English",

volume = "83",

pages = "2494--2499",

journal = "Journal of Applied Polymer Science",

issn = "0021-8995",

publisher = "John Wiley \& Sons Inc.",

number = "11",

}

TY - JOUR

T1 - A new photopolymerization system for vinyl monomers

AU - Öz, Nesrin

AU - Akar, Ahmet

PY - 2002/3/14

Y1 - 2002/3/14

N2 - A mixture of Ce+3 salt and an aminomethylene phosphonic acid, such as amino tri(methylene phosphonic acid) (ATMP), diethylene triamine penta(methylene phosphonic acid), N,N-di(methylene phosphonic acid) ethanol amine, N,N-di(methylene phosphonic acid)-N-methylamine, N-oxo-N,N,N-tri(methylene phosphonic acid), or 1-hydroxy-ethylidene-1,1-diphosphonic acid, was used for the photopolymerization of acrylonitrile, vinyl acetate, acrylic acid, and styrene in water. Molecular weights of the polymers decreased with increasing concentration of both Ce+3 salt and ATMP. The effect of oxygen, light, pH, and the addition order on polymerization were also studied.

AB - A mixture of Ce+3 salt and an aminomethylene phosphonic acid, such as amino tri(methylene phosphonic acid) (ATMP), diethylene triamine penta(methylene phosphonic acid), N,N-di(methylene phosphonic acid) ethanol amine, N,N-di(methylene phosphonic acid)-N-methylamine, N-oxo-N,N,N-tri(methylene phosphonic acid), or 1-hydroxy-ethylidene-1,1-diphosphonic acid, was used for the photopolymerization of acrylonitrile, vinyl acetate, acrylic acid, and styrene in water. Molecular weights of the polymers decreased with increasing concentration of both Ce+3 salt and ATMP. The effect of oxygen, light, pH, and the addition order on polymerization were also studied.

KW - Aminomethylene phosphonic acid

KW - Cerious salt

KW - Organophosphorous compounds

KW - Photopolymerization

KW - Vinyl monomers

UR - https://www.scopus.com/pages/publications/0037075656

U2 - 10.1002/app.10264

DO - 10.1002/app.10264

M3 - Article

AN - SCOPUS:0037075656

SN - 0021-8995

VL - 83

SP - 2494

EP - 2499

JO - Journal of Applied Polymer Science

JF - Journal of Applied Polymer Science

IS - 11

ER -

A new photopolymerization system for vinyl monomers

Abstract

Keywords

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