A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering

T. Tavsanoglu; O. Yucel; O. Addemir; M. Jeandin

A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering

T. Tavsanoglu^*, O. Yucel, O. Addemir, M. Jeandin

^*Corresponding author for this work

Department of Metallurgical and Materials Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

3 Citations (Scopus)

Abstract

The B-C-N system is characterized by short bond lengths and includes the hardest known materials, c-BN and B4C, as well as other materials with remarkable tribological properties such as h-BN. Despite these good properties, adhesion problems were observed for B₄C and BCN thin films on steel and Si substrates when the film thickness exceeds 500 nm. To enhance the adhesion, three functionally graded designs; surface boronizing of the steel substrate before deposition (Boride underlayer/B₄C), Ti/TiC/B ₄C and Ti/TiN/BCN structures were discussed. Cross-sectional FE-SEM examinations and elemental depth profiling by SIMS were revealed the graded structure of the films. The elemental film composition was measured by EPMA. The mechanical properties were determined by nanoindentation and the tribological properties by pin-on disc measurements. The results demonstrated the possibility of growing well adherent boron carbide and boron carbonitride films with thicknesses in the μm range.

Original language	English
Title of host publication	TMS2008 - 137th Annual Meeting and Exhibition Supplemental Proceedings
Subtitle of host publication	Materials Processing and Properties
Pages	279-285
Number of pages	7
Publication status	Published - 2008
Event	TMS 2008 Annual Meeting Supplemental: Materials Processing and Properties - New Orleans, LA, United States Duration: 9 Mar 2008 → 13 Mar 2008

Publication series

Name	TMS Annual Meeting
Volume	1

Conference

Conference	TMS 2008 Annual Meeting Supplemental: Materials Processing and Properties
Country/Territory	United States
City	New Orleans, LA
Period	9/03/08 → 13/03/08

Keywords

BCN
Boron carbide
FGM
Plasma enhanced magnetron sputtering
SIMS

Cite this

@inproceedings{49ba32dbf70442f0b49c598790041d9d,

title = "A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering",

abstract = "The B-C-N system is characterized by short bond lengths and includes the hardest known materials, c-BN and B4C, as well as other materials with remarkable tribological properties such as h-BN. Despite these good properties, adhesion problems were observed for B4C and BCN thin films on steel and Si substrates when the film thickness exceeds 500 nm. To enhance the adhesion, three functionally graded designs; surface boronizing of the steel substrate before deposition (Boride underlayer/B4C), Ti/TiC/B 4C and Ti/TiN/BCN structures were discussed. Cross-sectional FE-SEM examinations and elemental depth profiling by SIMS were revealed the graded structure of the films. The elemental film composition was measured by EPMA. The mechanical properties were determined by nanoindentation and the tribological properties by pin-on disc measurements. The results demonstrated the possibility of growing well adherent boron carbide and boron carbonitride films with thicknesses in the μm range.",

keywords = "BCN, Boron carbide, FGM, Plasma enhanced magnetron sputtering, SIMS",

author = "T. Tavsanoglu and O. Yucel and O. Addemir and M. Jeandin",

year = "2008",

language = "English",

isbn = "9780873397162",

series = "TMS Annual Meeting",

pages = "279--285",

booktitle = "TMS2008 - 137th Annual Meeting and Exhibition Supplemental Proceedings",

note = "TMS 2008 Annual Meeting Supplemental: Materials Processing and Properties ; Conference date: 09-03-2008 Through 13-03-2008",

}

Tavsanoglu, T, Yucel, O, Addemir, O & Jeandin, M 2008, A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering. in TMS2008 - 137th Annual Meeting and Exhibition Supplemental Proceedings: Materials Processing and Properties. TMS Annual Meeting, vol. 1, pp. 279-285, TMS 2008 Annual Meeting Supplemental: Materials Processing and Properties, New Orleans, LA, United States, 9/03/08.

A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering. / Tavsanoglu, T.; Yucel, O.; Addemir, O. et al.
TMS2008 - 137th Annual Meeting and Exhibition Supplemental Proceedings: Materials Processing and Properties. 2008. p. 279-285 (TMS Annual Meeting; Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering

AU - Tavsanoglu, T.

AU - Yucel, O.

AU - Addemir, O.

AU - Jeandin, M.

PY - 2008

Y1 - 2008

N2 - The B-C-N system is characterized by short bond lengths and includes the hardest known materials, c-BN and B4C, as well as other materials with remarkable tribological properties such as h-BN. Despite these good properties, adhesion problems were observed for B4C and BCN thin films on steel and Si substrates when the film thickness exceeds 500 nm. To enhance the adhesion, three functionally graded designs; surface boronizing of the steel substrate before deposition (Boride underlayer/B4C), Ti/TiC/B 4C and Ti/TiN/BCN structures were discussed. Cross-sectional FE-SEM examinations and elemental depth profiling by SIMS were revealed the graded structure of the films. The elemental film composition was measured by EPMA. The mechanical properties were determined by nanoindentation and the tribological properties by pin-on disc measurements. The results demonstrated the possibility of growing well adherent boron carbide and boron carbonitride films with thicknesses in the μm range.

AB - The B-C-N system is characterized by short bond lengths and includes the hardest known materials, c-BN and B4C, as well as other materials with remarkable tribological properties such as h-BN. Despite these good properties, adhesion problems were observed for B4C and BCN thin films on steel and Si substrates when the film thickness exceeds 500 nm. To enhance the adhesion, three functionally graded designs; surface boronizing of the steel substrate before deposition (Boride underlayer/B4C), Ti/TiC/B 4C and Ti/TiN/BCN structures were discussed. Cross-sectional FE-SEM examinations and elemental depth profiling by SIMS were revealed the graded structure of the films. The elemental film composition was measured by EPMA. The mechanical properties were determined by nanoindentation and the tribological properties by pin-on disc measurements. The results demonstrated the possibility of growing well adherent boron carbide and boron carbonitride films with thicknesses in the μm range.

KW - BCN

KW - Boron carbide

KW - FGM

KW - Plasma enhanced magnetron sputtering

KW - SIMS

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M3 - Conference contribution

AN - SCOPUS:53849113997

SN - 9780873397162

T3 - TMS Annual Meeting

SP - 279

EP - 285

BT - TMS2008 - 137th Annual Meeting and Exhibition Supplemental Proceedings

T2 - TMS 2008 Annual Meeting Supplemental: Materials Processing and Properties

Y2 - 9 March 2008 through 13 March 2008

ER -

A functionally graded design study for boron carbide and boron carbonitride thin films deposited by plasma-enhanced DC magnetron sputtering

Abstract

Publication series

Conference

Keywords

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