A 180-nm X-Band Cryogenic CMOS LNA

Alican Caglar, Mustafa Berke Yelten*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

This letter presents the measurement results of a 180-nm complementary metal-oxide-semiconductor (CMOS) X -band low-noise amplifier (LNA) at both 77 and 300 K. The designed LNA provides S11 and S22 below -10 dB at both temperatures within 6.4-7.4 GHz band. At 300 K, the voltage gain of the designed LNA is higher than 12.5 dB, and it provides an average noise temperature of 275 K, as well as -1 dBm IIP3. At 77 K, the LNA has approximately an 18-dB voltage gain, 78-K noise figure (NF), and -3 dBm IIP3. The presented work is the first implemented X -band cryogenic CMOS LNA in the literature.

Original languageEnglish
Article number9043508
Pages (from-to)395-398
Number of pages4
JournalIEEE Microwave and Wireless Components Letters
Volume30
Issue number4
DOIs
Publication statusPublished - Apr 2020

Bibliographical note

Publisher Copyright:
© 2001-2012 IEEE.

Funding

Manuscript received February 11, 2020; accepted March 4, 2020. Date of publication March 19, 2020; date of current version April 8, 2020. This work was supported by the Technological Research Council of Turkey under the project TÜB˙TAK 1001 215E080. (Corresponding author: Mustafa Berke Yelten.) Alican Çag˘lar was with the Department of Electronics and Communications Engineering, Istanbul Technical University, 34467 Istanbul, Turkey. He is now with IMEC-BEIOT, 3001 Leuven, Belgium (e-mail: [email protected]).

FundersFunder number
Technological Research Council of TurkeyTÜB˙TAK 1001 215E080

    Keywords

    • Complementary metal-oxide-semiconductor (CMOS)
    • cryogenics
    • linearity
    • low-noise amplifier (LNA)

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